3 rotary target plasma sputtering coater is a compact three rotary target plasma sputtering coater with a touch screen digital controller, and a substrate heater capable of heating up to 500 °C. It can coat 1-3 types of metallic materials to sample with the diameter up to 50 mm.Three sputtering targets: gold, silver, copper are included for immediate use.
3 rotary target plasma sputtering coater is a compact plasma thin film sputter (DC common type). The control panel adopts the touch screen mode. The substrate has a limit of 2", the sample is placed with a diameter of Ø50mm and the heating temperature is 500℃.3 rotary target plasma sputtering coater can sputter gold, silver and copper targets, and can not sputter light metals and carbon. This machine uses a rotating sample stage to sequentially coat three layers on the same sample.The film is suitable for the preparation of samples in the laboratory.
1600 VDC,40 mA max
Sample Stage with Heater
Stainless steel shield cage is included for extra protection
440 mm L × 330 mm W × 455 mm H
One year limited with lifetime support
HIGH VOLTAGE! Sputtering heads connect to high voltage. For safety, the operator must shut down the equipment before sample loading and target changing operations
This model is not suitable for coating light metallic material such as Al, Mg, Zn, Ni, etc. due to low energy. Please consider our magnetron sputtering coater or thermal evaporation coater.