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3 Rotary Target Plasma Sputtering Coater with Substrate Heater 3 Rotary Target Plasma Sputtering Coater with Substrate Heater 3 Rotary Target Plasma Sputtering Coater with Substrate Heater

3 Rotary Target Plasma Sputtering Coater with Substrate Heater

    3 rotary target plasma sputtering coater is a compact three rotary target plasma sputtering coater with a touch screen digital controller, and a substrate heater capable of heating up to 500 °C. It can coat 1-3 types of metallic materials to sample with the diameter up to 50 mm.Three sputtering targets: gold, silver, copper are included for immediate use.

3 rotary target plasma sputtering coater  is a compact plasma thin film sputter (DC common type). The control panel adopts the touch screen mode. The substrate has a limit of 2", the sample is placed with a diameter of Ø50mm and the heating temperature is 500℃.3 rotary target plasma sputtering coater can sputter gold, silver and copper targets, and can not sputter light metals and carbon. This machine uses a rotating sample stage to sequentially coat three layers on the same sample.The film is suitable for the preparation of samples in the laboratory.

Plasma Sputtering Coater

3 rotary target plasma sputtering coater specifications:

Input Power

  • Single phase 220 VAC, 50 / 60Hz

  • 700 W (including vacuum pump)

  • For using 110 VAC, we will include a transformer for you.

Output Power

1600 VDC,40 mA max

Vacuum Chamber

  • Vacuum chamber: 150 mm ID×165mm OD×150 mm H, made of high purity quartz

  • Sealing flange made of stainless steel with flat O-ring

Sample Stage with Heater

  • Stage size: 50 mm Dia.

  • Sputtering distance range: 25 –40 mm adjustable

  • Rotatable stage with three sputtering positions (controlled by the touch screen)

  • Substrate heater is built-in with a maximum heating temperature of 500 °C

  • PID temperature controller with +/- 1 °C accuracy is integrated into the touch screen

Control Panel

  • 6” color touch screen with PLC integration for easy operation

  • Vacuum gauge, sputtering current meter, and substrate temperature control are integrated to the touch screen panel

  • Adjustment knobs on the front panel for gas intake and sputtering current control

  • Sputtering position, sputtering timer, and process logging are accessible from the touch screen


Stainless   steel shield cage is included for extra protection

Sputtering Targets

  • Target size requirements: 47 mm Dia.×2.5 mm max

  • Three targets are included in the standard package for immediate use:

    • Au target, 47 mm Dia.×0.12 mm

    • Ag target, 47 mm Dia.×0.5 mm

    • Cu target, 47 mm Dia.×2.5 mm

  • You may order various targets at CYKY


440 mm L × 330 mm W × 455 mm H

Net Weight

50 kg


One year limited   with lifetime support


HIGH VOLTAGE! Sputtering heads connect to high voltage. For safety, the operator must shut down the equipment before sample loading and target changing   operations

This model is not suitable for coating light metallic material such as Al, Mg, Zn, Ni, etc. due to low energy. Please consider our magnetron sputtering coater or   thermal evaporation coater.

Contact Us
  • E-mail: cysi@cysi.wang
  • Tel: +86 371 5519 9322
  • Fax: +86 371 8603 6875
  • Add: No. 820, 8th Floor, 1st Unit, 9th Block, Cuizhu Street, High-Tech Zone, Zhengzhou, Henan, China
  • Korea Distributor:
    NEO LFN Corp
    Contact:Haeseop Kim
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