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3 heads compact RF plasma magnetron sputtering coater 3 heads compact RF plasma magnetron sputtering coater 3 heads compact RF plasma magnetron sputtering coater

3 heads compact RF plasma magnetron sputtering coater

    3 heads compact RF plasma magnetron sputtering coater is designed for non-metallic thin film coating, mainly for multilayer oxide thin films.DC magnetron sputtering option is available upon request for metallic film deposition, enabling three DC, one RF/two DC, and two RF/one DC sputtering head configurations.

3 heads compact RF plasma magnetron sputtering coater is mainly used to make non-conductive films, especially some oxide films.It is the most cost-effective coater for researching in the new generation of oxide thin films.

3 heads compact RF plasma magnetron sputtering coater specifications:

Input Power

  • Single phase 220 VAC, 50 / 60 Hz

  • 1000 W (including vacuum pump and water chiller)

  • If the voltage is 110 V, a 1500 W transformer can be ordered at our company

Power Source

  • 13.5 MHz, 100 W RF generator with manual matching is included and connected to the sputtering heads

  • Load range: 0 – 80 Ω adjustable. Tuning range: -200j – 200j adjustable

  • The rotatable switch can activate one sputtering head at a time. Sputtering heads can be switched “in the plasma” (no breaking of vacuum and plasma during a multilayer process)

  • With a DC power supply, the coater can be easily modified into 1” DC sputtering sources for metallic film deposition, enabling three DC, one RF / two DC, and two RF / one DC sputtering head configurations 

Magnetron Sputtering Head

  • Three 1" magnetron sputtering heads with water cooling jackets are included and inserted into quartz chamber via quick clamps

  • One manually operated shutter is built on the flange  

  • One 10 L/min digitally controlled recirculating water chiller is included for cooling sputtering heads

Sputtering Target

  • Target size requirement: 1" diameter×1/8" thickness max

  • Sputtering distance range: 50 – 80 mm adjustable

  • Sputtering angle range: 0 – 25° adjustable 

  • 1" diameter Cu target and Al2O3 target are included for demo testing

Vacuum Chamber

  • Vacuum chamber: 256 mm OD×238 mm ID×276 mm Height, made of high purity quartz

  • Sealing flange: 274 mm Dia. made of Aluminum with high-temperature silicone O-ring

  • Stainless steel shield cage is included for 100% shielding of RF radiation from the chamber

  • Max vacuum level: 1.0E-5 Torr with optional turbo pump and chamber baking 

Sample Holder

  • Sample holder is a rotatable and heatable stage made of ceramic heater with stainless steel cover

  • Sample holder size: 50 mm Dia. for. 2" wafer max

  • Rotation speed: 1-10 rpm adjustable for uniform coating

  • The holder temperature is adjustable from RT to 600 °C max (5 min max at 600 °C; 2 hr max at 500 °C) with accuracy +/- 1.0 °C via a digital temperature controller

Vacuum Pump

  • KF40 vacuum port is built in for connecting to a vacuum pump.

  • Vacuum level: 1.0E-2 Torr with included dual stage mechanical pump

Size

540 mm L×540 mm W×1000 mm H

Net Weight

60 kg

Warranty

One years limited warranty with lifetime support 

Contact Us
  • E-mail: cysi@cysi.wang
  • Tel: +86 371 5519 9322
  • Fax: +86 371 8603 6875
  • Add: No. 820, 8th Floor, 1st Unit, 9th Block, Cuizhu Street, High-Tech Zone, Zhengzhou, Henan, China
  • Korea Distributor:
    NEO LFN Corp
    Email:info@neolfn.com
    Tel:+82-31-999-4944
    Contact:Haeseop Kim
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