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DC/RF Dual-Head High Vacuum 2" Magnetron Plasma Sputtering Coater DC/RF Dual-Head High Vacuum 2" Magnetron Plasma Sputtering Coater DC/RF Dual-Head High Vacuum 2" Magnetron Plasma Sputtering Coater

DC/RF Dual-Head High Vacuum 2" Magnetron Plasma Sputtering Coater

Basic Info

  • Model NO.: CY-VTC-600-2HD

  • Coating: Plasma Sputtering Coater

  • Certification: CE

  • Product Name: DC/RF Dual-Head Magnetron Plasma Sp

  • RF Source: 300W

  • Transport Package: Wooden Case

  • Origin: China

  • Type: Coating Production Line

  • Substrate: Ceramic and Metal

  • Condition: New

  • DC Source: 500W

  • Trademark: CYKY

  • Specification: plasma sputtering system

Product DescriptionDC/RF Dual-Head High Vacuum 2" Magnetron Plasma Sputtering Coater
CY-VTC-600-2HD is a compact magnetron sputtering system with dual 2"  target sources, e.g., one DC source for coating metallic film, and another RF source for coating non-metallic material. A film thickness tracker is included to enable the user to control processing easily. This coater is designed for coating both single or multiple film layers for a wide range of  materials, such as alloy, ferroelectric, semiconductor, ceramic, dielectric, optical, PTFE  etc.  at low cost.
Specification of the dual head magnetron plasma sputtering coater

Input Power220VAC 50/60Hz, single phase
2000W (including pump)

Source Power
Two sputtering power sources are integrated into one control box 
DC source: 500W for coating metallic materials 
RF source: 300W for coating non-metallic materials

Magnetron Sputtering Head
Two 2" Magnetron Sputtering Heads with water cooling jackets are included
One is connected to RF source for non-conductive materials
The other one is connected to DC source for coating metallic materials
Target size requirement: 2" diameter
Thickness Range: 0.1 - 5 mm for both metallic and non-conductive targets (including backing plate)
One Cu and one fused SiO2 targets are included for demo testing
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  • Customized coater: Two DC heads without RF sputtering; two RF heads without DC sputering; 3 RF head are available upon request

  • Optional: 148 cm RF cable is replaceale with extra cost

Vacuum ChamberVacuum Chamber: 300 mm Dia x 300 mm height, made of stainless steel
Observation Window: 100 mm diameter
Hinged type lid on top with pneumatic power pole makes target exchange easily

Sample Holder
Sample holder size: 140mm dia. for. 4" wafer max
Sample holder rotation speed is adjustable: 1 - 20 rpm for uniform coating
The holder temperature is adjustable from RT to 500°C Max with accuracy +/- 1.0 °C
Gas Flow Control
Two precision digital MFC (mass flow controller) are installed to allow two types of gases to be filled in
Flow rate: 200 ml/min max. (0-200 SCCM)
Flow rate is adjustable on the 6" touch screen control panel
Vacuum Pump Station
High speed turbo vacuum pump (made in Germany) is directly installed on the vacuum chamber for max. vacuum level 
Heavy duty dual stage mechanical pump, 220 liters/minute (7.8CFM) is connected to turbo pump for faster pumping speed
Mobile pump station is included and the compact sputtering coater can be placed on top of station
Standard Vacuum Level: < 4x10^-5 Torr . Max. vacuum level: 10^-6 torr with chamber baking
Water Chiller
One Digital Temperature Controlled Recirculating Water Chiller is included for cooling both magnetron sputtering heads.
Refrigeration range : 5~35°C
Floowing Rate: 16L/minute

Precise quartz Film Thickness Monitor is available upon reuqest to built into the chamber to monitor coating thickness with accuracy 0.10 Å.
Pricesion Thin Film & Coating Analysis Systems with Measurement Capability is available for measure film thickness after coating.

Overall Dimensions

Lid closed: 48" × 28" × 32" Lid open: 48" × 28" × 37"
Net Weight200 kg
WarrantyOne years limited warranty with lifetime support

reference picture of the dual head magnetron plasma sputtering coater
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DC/RF Dual-Head High Vacuum 2DC/RF Dual-Head High Vacuum 2

DC/RF Dual-Head High Vacuum 2
our company information:

Zhengzhou CY Scientific Instrument Co., Ltd.-founded in  2013 is a high and new technology enterprise registered in Zhengzhou,Henan province. We mainly supply the lab instruments for material research in labs like the cutting machine, milling machine, polishing machine, sintering furnace, mixing machine, glove box, film coating machine, etc.

contact information:
contact person: Tanya Wang 
contact phone: 0086 371 55365392

Contact Us
  • E-mail: cysi@cysi.wang
  • Tel: +86 371 5519 9322
  • Fax: +86 371 8603 6875
  • Add: No. 820, 8th Floor, 1st Unit, 9th Block, Cuizhu Street, High-Tech Zone, Zhengzhou, Henan, China
  • Korea Distributor:
    NEO LFN Corp
    Contact:Haeseop Kim
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