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Laboratory DC/RF Dual-Head 2" Magnetron Plasma Sputtering Coater-CY-600-2HD Laboratory DC/RF Dual-Head 2" Magnetron Plasma Sputtering Coater-CY-600-2HD Laboratory DC/RF Dual-Head 2" Magnetron Plasma Sputtering Coater-CY-600-2HD Laboratory DC/RF Dual-Head 2" Magnetron Plasma Sputtering Coater-CY-600-2HD Laboratory DC/RF Dual-Head 2" Magnetron Plasma Sputtering Coater-CY-600-2HD Laboratory DC/RF Dual-Head 2" Magnetron Plasma Sputtering Coater-CY-600-2HD

Laboratory DC/RF Dual-Head 2" Magnetron Plasma Sputtering Coater-CY-600-2HD

    Breif Introduction

      CY-600-2HD is a compact magnetron sputtering system with dual 2" target sources.The DC source for metallic film coating, and the other RF source for non-metallic material coating . This coating system is designed for coating both single or multiple film layers, such as alloy, ferroelectric, semiconductor, ceramic, dielectric, optical, PTFE, etc

Input Power

1.220VAC 50/60Hz, single phase
     2.2000W  (including pump)

Source Power

1.Two sputtering power sources are integrated into one control box

2. DC source: 500W for coating metallic materials

3.RF source: 600W with automatching for coating non-metallic materials ( Center)

4.Compact 300 RF source is available at extra cost

Magnetron Sputtering  Head

1.Two 2" Magnetron Sputtering  Heads with water cooling jackets are included  
     One is connected to RF power supply for no-conductive materials  
     Another is connected to DC sputtering power source for coating metallic materials

2.Target size requirement: 2" diameter

3.Thickness Range: 0.1 - 5 mm for both metallic and non-conductive targets

4.One stainless steel and one Al2O3 ceramic targets are included for demo testing

5.Head Water Cooling: 10ml/min water flow required, and one 16ml/min digitally 
     controlled recirculating water chiller is included for cooling both magnetron sputtering 
     heads

6.Customized coater: Two DC head without, RF sputtering,  RF head without 
     DC sputering,3 RF head are available upon request

Vacuum Chamber

1.Vacuum Chamber: 300 mm Dia x 300 mm height, made of stainless steel

2.Observation Window:  100 mm diameter

Sample Holder

1.Sample holder size: 140mm dia. for. 4" wafer max

2.Sample holder rotation speed is adjustable: 1 - 20 rpm for uniform coating

3.The holder temperature is adjustable from RT to 500°C Max with accuracy +/- 1.0 °C

Gas Flow Control

1.Flow rate:  200 ml/min max.

2.Flow rate is adjustable on the 6" touch screen control panel

Vacuum Pump Station

High speed turbo vacuum pump system is directly installed on the vacuum chamber
      for max. vacuum level 

Heavy duty dual stage mechanical pump is connected to turbo pump for faster 
     pump speed

Mobile pump station is included and the compact sputtering coater can be put on
     top of station

Max. vacuum level: 10^-6 torr with chamber baking     

Thickness Monitor

One Precision quartz thickness sensor is built into the chamber to monitor coating 
     thickness with accuracy 0.10 Å  

LED Display Unit outside chamber can:

Input material to be coated according to data base included

Display total thickness coated and coating speed

 5 pcs quartz sensors (consumable) are included 

Water cooling is required

Overall Dimensions

L6600mm× W660mm× H1200mm

Application Note

In order to remove oxygen from the chamber,  suggest you use 5% Hytrogen + 95 % 
     Nitrogen to clan chamber 2-3 times, which can reduce oxygen to below 10 ppm

Please use > 5N purity Argon gas for plasma sputtering.  Even though 5N purity Ar, usually contain 10- 100 ppm oxygen and H2O

Net Weight

160 kg

Warranty

One years limited warranty with lifetime support

Contact Us
  • E-mail: cysi@cysi.wang
  • Tel: +86 371 5519 9322
  • Fax: +86 371 8603 6875
  • Add: No. 820, 8th Floor, 1st Unit, 9th Block, Cuizhu Street, High-Tech Zone, Zhengzhou, Henan, China
  • Korea Distributor:
    NEO LFN Corp
    Email:info@neolfn.com
    Tel:+82-31-999-4944
    Contact:Haeseop Kim
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