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How to improve the efficiency of sputtering target material

Although increasing the pressure can improve the ionization rate, but at a higher pressure, the chance of collision between the sputtering target particles and gas also increases

What is the principle of sputtering target

Sputtering target is a new physical vapor coating method, which has obvious advantages in many aspects compared with earlier evaporation coating method. As a mature technology, magnetron sputtering has been applied in many fields. The company makes "new concept, new technology, sputtering target new products" and "the pursuit of customer satisfact

Operation process of magnetron sputtering coating target material

The operation process of magnetron sputtering target is not clear to many people, and the work content of magnetron sputtering target is not understood

Characteristics of magnetron sputtering target material

Magnetron sputtering coating is a new physical vapor coating method, compared with earlier evaporation coating method, its many advantages are quite obvious. As a mature technology, magnetron sputtering has been applied in many fields

Magnetron sputtering coating classification

There are many types of magnetron sputtering. Each has different working principles and application objects. However, they have one thing in common: the interaction between magnetic field and electric field is used to make electrons run in spiral shape near the target surface, thus increasing the probability of electrons striking argon to produce

What are the uses of magnetron sputtering coating

Sputtering film targets can be roughly divided into mechanical and physical functional films according to their different functions and applications

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