Horizontal high vacuum three-target magnetron sputtering coater for alloy thin films

The three-target magnetron sputtering coater can be used to prepare single-layer or multi-layer ferroelectric thin films, conductive thin films, alloy thin films, etc. Compared with similar equipment, the three-target magnetron sputtering coater is not only widely used, but also has the advantages of small size and easy operation. It is an ideal equipment for preparing material thin films in the laboratory. The three-target magnetron sputtering coater is a cost-effective magnetron sputtering coating equipment independently developed by our company, which has the characteristics of standardization, modularization and customizability. The magnetron target is 2 inches, and customers can choose it according to the size of the substrate to be plated; the power supply is two 500W DC power supplies and one 300W RF power supply. The DC power supply can be used for the preparation of metal films, and the two targets can meet the needs of multi-layer or multiple coatings. The coater has two high-precision mass flow meters. If the customer has other needs, the gas path of up to four mass flow meters can be customized to meet the needs of complex gas environment construction; the instrument is equipped with an advanced turbomolecular pump group as standard, and the ultimate vacuum can reach 1.0E-5Pa. At the same time, other types of molecular pumps are available for purchase. The gas route of the molecular pump is controlled by multiple solenoid valves, which can open the cavity to take out the sample without turning off the pump, greatly improving your work efficiency. This product can be equipped with an all-in-one industrial computer to control the system. The computer program can realize most functions such as the control of the vacuum pump group and the control of the sputtering power supply, which can further improve your experimental efficiency.

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