RF power supply | Signal frequency | 13.56MHz |
Power output range | 0~500W |
Maximum reflected power | 100W |
Reflected power
(at maximum power) | <5W |
Power stability | ±0.1% |
Working Chamber | Heating temperature | RT-1000℃ |
Temperature control accuracy | ±1℃ |
Sample holder | Φ200mm |
Rotating speed of sample
holder | 1-20rpm adjustable |
Spray head size | Φ90mm |
Distance | The distance between the spray head and the sample is 40-100mm continuously adjustable |
Working vacuum for
deposition | 0. 133- 133Pa (can be adjusted according to the technical process) |
Flange | The top flange can be lifted by the motor, the substrate is easy to change, and there is a visual window |
Chamber | Stainless steel material, Φ500mm * 500mm |
Observation window | Φ100mm, with baffle |
Gas supply system | Channel numbers | 6 |
Measuring unit | Mass flow controller |
Measuring range | A channel: 0～200SCCM for H2 | Remarks: If other ranges are required, please specify when ordering. According to the customer's specific requirements, the flow meter of corresponding gas type and range is optional. |
B channel: 0～200SCCM for CH4 |
C channel: 0～200SCCM for C2H4 |
C channel: 0～500SCCM for N2 |
D channel: 0～500SCCM for NH3 |
E channel: 0～500SCCM for Ar |
Measurement accuracy | ±1.5%F.S |
Working pressure difference | -0.15Mpa~0.15Mpa |
Connecting pipe | 304 stainless steel |
Gas channel | 304 stainless steel needle valve |
Interface specification | 1/4" ferrule connector for gas inlet and outlet |
Vacuum system | Backing pump | 4.7L/s |
Molecular pump | 1200L/s |
Vacuum measurement | Compound vacuum gauge, range 10-5Pa ~ 105Pa |
Vacuum degree | 5.0*10-3Pa |
Water chiller | Cooling water temperature | ≦37℃ |
Water flow | 10L/min |
Power | 0.1KW |
Cooling power | 50W/℃ |
Power supply | AC220V 50Hz |
