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Three targets DC magnetron sputtering coater CY-MSP300S-3DCThree targets DC magnetron sputtering coater CY-MSP300S-3DC

Three targets DC magnetron sputtering coater CY-MSP300S-3DC

    Three targets DC magnetron sputtering coater is a cost-effective magnetron sputtering coating equipment independently developed by our company. It is standardized, modular and customizable. There are 1-inch or 2-inch magnetron targets for you to choose. Customers can choose the target according to the size of the substrate to be coated.

Three targets DC magnetron sputtering coater is equipped with 500W DC power supply. The DC power supply can be used for the preparation of metal film. The three targets can meet the needs of multi-layer or multiple coatings. If customers have other coating needs, DC power supply and pulse power supply can be customized. Various types of power supply are available from 300W to 1000W in various specifications.

The coating machine is equipped with two-channel high-precision mass flowmeter. If you have other requirements, you can customize the gas path of up to four-channel mass flowmeters to meet the complex gas environment construction requirements. The instrument is equipped with advanced turbomolecular pump sets, the ultimate vacuum is up to 1.0E-5Pa, and other types of molecular pumps are available for purchase. Molecular pump gas path is controlled by multiple solenoid valves, you can open the chamber to take out the sample without shutting down the pump, greatly improving your work efficiency. This product can be equipped with an integrated industrial computer to control the system. In the computer program, most functions such as vacuum pump control and sputtering power control can be realized, which can further improve your experimental efficiency.

Three targets DC magnetron sputtering coater application:

This device can be used for preparing single-layer or multi-layer ferroelectric thin films, conductive films, alloy films, and the like. Compared with similar equipment, this three targets magnetron sputtering coater is not only widely used, but also has the advantages of small size and easy operation, and is an ideal equipment for preparing material films in a laboratory.

Three targets DC magnetron sputtering coater technical parameters:

Sample stage



Temperature control accuracy


Heating temperature

Max 500℃

Rotate speed

1-20rpm adjustable

Magnetron Sputtering   target head


2”×3 (1”,2” optional)

Water chiller

Circulating water chiller   with flow rate of 10L/min

Cooling mode

Water cooling

Vacuum chamber

Chamber size


Watch window


Chamber material

Stainless steel

Opening mode

Top cover open

Mass flowmeter

2 channels; measuring   range 100sccm; 100sccm (can be customized according to customer needs)

Vacuum system



Pumping interface


Molecular pump


Exhaust interface


Backing pump

rotary vane pump

Vacuum measurement

Compound vacuum gauge

Ultimate vacuum


Power supply

AC;220V 50/60Hz

Pumping rate

Molecular pump:   600L/S  rotary vane pump: 1.1L/S  

Comprehensive gas pumping performance: vacuum up to 1.0E-3Pa in 20 minutes

Power configuration


DC power supply×3

Max output power

DC 500 W

Other parameters

Supply voltage


Overall size


Total power


Total Weight


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