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Desktop single target magnetron sputtering coater with reciprocating sample tableDesktop single target magnetron sputtering coater with reciprocating sample tableDesktop single target magnetron sputtering coater with reciprocating sample table

Desktop single target magnetron sputtering coater with reciprocating sample table

    Desktop single target magnetron sputtering coater is a high cost performance magnetron sputtering coater equipment independently developed by our company, which has the characteristics of miniaturization and standardization. 

Desktop single target magnetron sputtering coater is a high cost performance magnetron sputtering coater equipment independently developed by our company, which has the characteristics of miniaturization and standardization. The magnetron target can be selected from 1 inch and 2 inches, and customers can choose according to the size of the substrate to be plated; the power supply is 150W DC power supply, which can be used for metal sputtering coating. The coating instrument is equipped with a vent interface, which can be filled with protective gas. If the customer needs to mix gas, you can contact the staff to configure a high-precision mass flow meter to meet the needs of the experiment. The instrument is equipped with advanced turbo molecular pump set, the ultimate vacuum can reach 1.0E-5Pa, and other types of molecular pumps are also available for purchase.

Desktop single target magnetron sputtering coater application range:

The equipment can be used to prepare single-layer ferroelectric films, conductive films, alloy films, etc. Compared with similar equipment, this single-target magnetron sputtering coating instrument is compact in design, highly integrated, compact, and can be placed on a table for use. It is an ideal equipment for preparing material films in the laboratory.

Technical parameters of single target magnetron sputtering coater:

Reciprocating sample table

size

50*100mm

Reciprocating speed

0~50mm/s

Magnetron target gun

Target head plane

Circular flat target

Sputtering vacuum

10Pa0.2Pa

Target diameter

2 inches

Target thickness

Recommended 2~5mm

Target head temperature

65

Vacuum chamber

Chamber size

About Φ180mm × H 215mm

Chamber material

High purity quartz

Observation window

Omnidirectional transparency

Opening method

Removable top cover

Power supply

DC power supply

150W max

Quantity

1

Molecular pump system

Backing pump

Rotary vane pump

VRD-4

Pumping speed

1.1L/S

Ultimate vacuum

5*10-1Pa

Molecular pump

Molecular pumping speed

600L/S

Rated speed

24000rpm

Ultimate vacuum

5*10-5Pa

Vibration value

0.1um

Start Time

4.5min

Downtime

<7min

cooling method

Water cooling + air cooling

Water chiller

Cooling water temperature

37

Cooling water flow rate

10L/min

Supply voltage

AC220V 50Hz


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  • Tel: +86 371 5519 9322
  • Fax: +86 371 8603 6875
  • Add: No. 820, 8th Floor, 1st Unit, 9th Block, Cuizhu Street, High-Tech Zone, Zhengzhou, Henan, China




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