Three sputter sources magnetron sputtering coater with UPS
Three target magnetron sputtering coater is a cost-effective magnetron sputtering coating equipment independently developed by our company. this magnetron sputtering coater is standardized, modular and customizable.
Three target magnetron sputtering coater is a cost-effective magnetron sputtering coating equipment independently developed by our company. this magnetron sputtering coater is standardized, modular and customizable.
This device can be used for preparing single-layer or multi-layer ferroelectric thin films, conductive films, alloy films, semiconductor films, ceramic films, dielectric films, optical films, oxide films, hard films, PTFE films, and the like. Compared with similar equipment, this three-target magnetron sputtering coater is not only widely used, but also has the advantages of small size and easy operation, and is an ideal equipment for preparing material films in a laboratory.
Technical parameters of Three target magnetron sputtering coater:
Supply Voltage
VAC 220, 60Hz
UPS
20KVA 16KW, 1 hour delay
16 batteries, with capacity of 38AH
Vacuum Chamber
Dimension: Dia. 325 mm * H 385 mm
Material: 304 stainless steel
Viewport (Window): ~4'' (100mm) with shutter
Sample Stage
Top sample holder
Sample table: Dia. 150mm
Sample size: Max. 4'' diameter
Rotary speed: 0-40rpm adjustable
Heating temperature: up to 700℃
Water Chiller
Water flow rate: 2.3m3/h
Power: 3P
Cooling Capacity: 8250Kcal/h
Compressor output power: 2.25KW
Magnetron Sputtering Gun
3× 2'' magnetron sputter guns, with automatic shutter
Sputtering orientation upwards
Target diameter: 2''
Magnets: rare earth magnet
RF Generator
3 × RF 300W power supply with auto match
Power output range: 5W~300W
Maximum reflected power: 100W
Power stability: ±0.1%
Harmonic component: ≤-50dbc
Power supply: Single phase 187-253 VAC, 50/60HZ
Efficiency: ≥70%
Power factor: ≥90%
Reflected power (at maximum power): <3W
Maximum load current: 30ARMS
Maximum load voltage: 7500VRMS
RF output connector: 50 Ω, L29 or customized
Match time: 1~3s
Real part range of matched impedance: 0~80Ω
Imaginary part range of matched impedance:﹣200j~﹢200j
Cooling method: forced cooling
Mass Flow Meter
3 × MFC mass flow control (Ar, O2 and N2)
Measuring ranges: up to 20sccm
With pneumatic isolation valve(s) and filter.
Full Automatic control by PC or PLC, to control
Store for minimum 100 recipe
19'' Flat controller
Three target magnetron sputtering coater video:
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