This equipment is a desktop single-target magnetron sputtering coater. The equipment has been miniaturized and designed to limit the appearance of the equipment to the desktop level, greatly reducing the installation site requirements.
This equipment is a desktop single-target magnetron sputtering coater. The magnetron sputtering coater has been miniaturized and designed to limit the appearance of the equipment to the desktop level, greatly reducing the installation site requirements. The equipment is equipped with a DC power supply, which can be used for sputtering metal materials and has the characteristics of fast speed and low temperature rise. The whole vacuum chamber adopts the design of bottom target, which has good sputtering effect and less impurity pollution, which can protect the sample to the utmost extent.
magnetron sputtering coater technical parameters:
CY-MSP180S-DC-GU
Sample stage
size
φ100mm
Heating
Max. 500℃
Rotating speed
0-20 adjustable
Installation method
The sample stage is under the upper cover of the chamber, and the sample is installed as a clamp type
Magnetron sputtering target
Quantity
2” x2 Lower mounting with chamber lower flange
Vacuum chamber
Chamber size
Φ180mm x 215mm
Observation window
Front φ60mm
Chamber material
SS304
Opening method
Top cover open
Vacuum system
Mechanical pump
Rotary vane pump
Pumping interface
KF16
Molecular pump
Turbomolecular pump
Pumping interface
KF40
Vacuum measurement
Resistance gauge + ionization gauge
Exhaust interface
KF16
Ultimate vacuum
1.0E-4Pa
Power supply
AC 220V 50/60Hz
Pumping rate
Mechanical pump: 1.1L/s Molecular pump: 60L/S
Power configuration
Quantity
DC power supply x1
Maximum output power
DC power supply 300W
Other
Supply voltage
AC220V, 50Hz
Dimensions
550mm x 350mm x400mm
Total power
2kW
magnetron sputtering coater video:
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