This equipment is a desktop single-target magnetron sputtering coater. The equipment has been miniaturized and designed to limit the appearance of the equipment to the desktop level, greatly reducing the installation site requirements.
This equipment is a desktop single-target magnetron sputtering coater. The magnetron sputtering coater has been miniaturized and designed to limit the appearance of the equipment to the desktop level, greatly reducing the installation site requirements. The equipment is equipped with a DC power supply, which can be used for sputtering metal materials and has the characteristics of fast speed and low temperature rise. The whole vacuum chamber adopts the design of bottom target, which has good sputtering effect and less impurity pollution, which can protect the sample to the utmost extent.
magnetron sputtering coater technical parameters:
product name
Desktop bottom-single-target sputtering coater with stainless steel cavity
Product number
CY-MSZ180X-I-DC-SS
sample stage
Dimensions
φ100mm
Heating temperature
≦500℃
Adjustable speed
≦20rpm
Magnetic target gun
Equipped with a two-inch magnetic control target, target size: diameter 50.8mm, thickness ≦3mm
vacuum chamber
Cavity size
φ180mm X215mm
observation window
omnidirectionally transparent
Cavity material
304 stainless steel
Opening method
Removable top cover
Vacuum system
Backing pump
Low noise bipolar rotary vane pump
Molecular pump
Low noise and high pumping speed turbomolecular pump
Vacuum measurement
Composite vacuum gauge, range: 10-5~105Pa
Air extraction interface
KF16
Air extraction interface
KF40
Exhaust interface
KF16
System vacuum
1.0×10-4Pa
Power supply
AC 220V 50/60Hz
Pumping rate
The pumping speed of the molecular pump is 600L/s, and the pumping speed of the backing pump is 1.1L/s.
Power configuration
Number of power supplies
A set of DC power supply
Output Power
300W
Other parameters
Supply voltage
AC220V,50Hz
Total power
2kW
Overall size
550mm X 350mm X400mm
magnetron sputtering coater video:
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