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Dual target magnetron sputtering coater with reciprocating sample stageDual target magnetron sputtering coater with reciprocating sample stageDual target magnetron sputtering coater with reciprocating sample stage

Dual target magnetron sputtering coater with reciprocating sample stage

    CY-MSP500S-DCRF-RE is a laboratory magnetron sputtering coater with two target positions developed by our company. this magnetron sputtering coater is equipped with a DC power supply and a RF power supply, which can be used to prepare single or multilayer ferroelectric film, conductive film, alloy film, semiconductor film, ceramic film, dielectric film, optical film, etc.

CY-MSP500S-DCRF-RE is a laboratory-specific magnetron sputtering coater with two target positions developed by our company. The magnetron sputtering coater equipment is equipped with a DC power supply and a radio frequency power supply, which can be used to prepare single or multilayer iron Electrical film, conductive film, alloy film, semiconductor film, ceramic film, dielectric film, optical film, etc.

Features of magnetron sputtering coater:

a. Compared with ordinary plasma sputtering, magnetron sputtering has the advantages of high energy and speed, high coating rate, low sample temperature rise, and is a typical high-speed low-temperature sputtering.

b. The magnetron sputter target is equipped with a water-cooled interlayer. The water-cooled machine can effectively take away the heat and avoid the heat accumulation on the target surface, so that the magnetron sputter can work stably for a long time.

c. The sample stage adopts a reciprocating design, and the left side is equipped with a magnetic coupling push rod, which can push the sample stage left and right.

d. The whole machine adopts touch screen control, built-in one-button coating program, easy to operate, it is an ideal equipment for laboratory preparation of films

Technical parameters of magnetron sputtering coater:

Model

CY-MSP500S-DCRF-RE

Input

AC220V,50Hz

Total power

6KW

Ultimate vacuum degree

5x10-4Pa

Sample table parameters

Size

100mm x 100mm

Reciprocating stroke

200mm

Magnetron sputtering head parameters

Quantity

2-set, 2-inch

Cooling mode

Water cooled, required flow rate10L/min

Water chiller

10L/min circulating water cooling

Vacuum chamber

Size

φ500mm x 490mm H

Material

Stainless steel

Watch window

φ100mm

Open mode

front opening door

Gas flow controller

1channel 200sccm Ar;

Vacuum pump

Molecular pump system pumping 600L/S

Film thickness gauge

Quartz vibrating film thickness gauge, one set, Resolution 0.10 Å

Sputter power supply

DC power supply: one set, 500W, for preparing metal films

RF power supply: one set, 500W, for non - metallic coating

Operating mode

All-in-one computer operation

Overall dimensions

1090mm x 900mm x 1250mm

Total weight

350kg


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