Dual-target RF magnetron sputtering coater is equipped with two 300W RF power sources. The RF power supply can be used for the preparation of non-metal films. The two targets can meet the needs of multi-layer coatings. If customers have other coating needs, RF power supply and pulse power supply can be customized. Various types of power supply are available from 300W to 1000W in various specifications.
The coating machine has a two-channel high precision mass flow meter. If customers have other requirements, the gas channel of up to four-channel mass flow meter can be customized to meet the complex gas environment requirements. The instrument is equipped with advanced turbo molecular pump group, and ultimate vacuum is up to 1.0E-5Pa, and other types of molecular pumps are available for purchase.
In addition, this machine is equipped with two high precision film thickness gauges, which can meet the film thickness detection requirements during the coating process. If customers need to install multiple film thickness gauges, also can contact our technical staff for customization.
This product can be equipped with an integrated industrial computer to control the system. In the computer program, most functions such as vacuum pump control and sputtering power control can be realized, which can further improve your experimental efficiency.
Dual-target RF magnetron sputtering coater application:
This device can be used for preparing single-layer or multi-layer ferroelectric thin films, conductive films, alloy films, semiconductor films, ceramic films, dielectric films, optical films, oxide films, hard films, PTFE films, and the like. Compared with similar equipment, the dual-target magnetron sputtering coater is not only widely used, but also has the advantages of small size and easy operation, and is an ideal equipment for preparing material films in a laboratory.
Dual-target RF magnetron sputtering coater technical parameters:
Sample stage | Size | φ185mm |
Heating temperature | Max 500℃ |
Temperature accuracy | ±1℃ |
Rotational speed | 1-20rpm adjustable |
Magnetron Sputtering head | Quantity | 2”×2 (1”,2” optional) |
Cooling mode | Water cooling |
Water chiller | Circulating water chiller with flow rate of 10L/min |
Vacuum chamber | Chamber size | φ300mm×300mm |
Chamber material | Stainless steel |
Watch window | φ100mm |
Opening mode | Top cover open |
Mass flowmeter | 2 channels; measuring range 100SCCM; 100SCCM (can be customized according to customer needs) |
Vacuum system | Model | CY-GZK103-A |
Molecular pump | CY-600 |
Backing pump | Rotary vane pump |
Ultimate vacuum | 1.0E-5Pa |
Pumping interface | KF40 |
Exhaust interface | KF16 |
Vacuum measurement | Compound vacuum gauge |
Power supply | AC;220V 50/60Hz |
Pumping rate | Molecular pump: 600L/S rotary vane pump: 1.1L/S Comprehensive gas pumping performance: vacuum up to 1.0E-3Pa in 20 minutes |
Power configuration | Quantity | RF power supply×2 |
Max output power | RF 300W |
Other parameters | Supply voltage | AC220V,50Hz |
Total power | 2.5KW |
Overall size | 600mm×650mm×1280mm |
Total Weight | About 300kg |
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