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Dual-target RF magnetron sputtering coater (300W) CY-MSP300S-2RF

Dual-target RF magnetron sputtering coater (300W) CY-MSP300S-2RF

    Dual-target RF magnetron sputtering coater is a cost-effective magnetron sputtering coating equipment independently developed by our company. It is standardized, modular and customizable. There are 1-inch or 2-inch magnetron targets for you to choose. Customers can choose the target head according to the size of the substrate to be coated.

Dual-target RF magnetron sputtering coater is equipped with two 300W RF power supply. The DC power supply can be used for the preparation of metal film, and the RF power supply can be used for the preparation of non-metal. The two targets can meet the needs of multi-layer or multiple coatings.

The coating machine is equipped with two-channel high-precision mass flowmeter. If you have other requirements, you can customize the gas path of up to four-channel mass flowmeters to meet the complex gas environment construction requirements. The instrument is equipped with advanced turbomolecular pump sets, the ultimate vacuum is up to 1.0E-5Pa, and other types of molecular pumps are available for purchase. Molecular pump gas path is controlled by multiple solenoid valves, you can open the chamber to take out the sample without shutting down the pump, greatly improving your work efficiency. This product can be equipped with an integrated industrial computer to control the system. In the computer program, most functions such as vacuum pump control and sputtering power control can be realized, which can further improve your experimental efficiency.

Dual-target RF magnetron sputtering coater application:

This device can be used for preparing single-layer or multi-layer ceramic films, dielectric films, optical films, oxide films, hard films, PTFE films, and the like. Compared with similar equipment, the dual-target magnetron sputtering coater is not only widely used, but also has the advantages of small size and easy operation, and is an ideal equipment for preparing material films in a laboratory.

Dual-target RF magnetron sputtering coater technical parameters:

Sample stage



Heating temperature

Max 500

Temperature accuracy


Rotational speed

1-20rpm adjustable

Magnetron Sputtering head


2”×2 (1”,2” optional)

Cooling mode

Water cooling

Water chiller

Circulating water chiller with flow rate of 10L/min

Vacuum chamber

Chamber size


Chamber material

Stainless steel

Watch window


Opening mode

Top cover open

 Mass flowmeter

 2 channels; measuring range 100SCCM; 100SCCM (can be customized according to customer needs)

Vacuum system



Molecular pump


Backing pump

Rotary vane pump

Ultimate vacuum


Pumping interface


Exhaust interface


Vacuum measurement

Compound vacuum gauge

Power supply

AC;220V   50/60Hz

Pumping rate

Molecular pump: 600L/S rotary vane pump: 1.1L/S  

Comprehensive gas pumping performance: vacuum up to 1.0E-3Pa in 20 minutes

Power configuration


RF power supply×2

Max output power

RF 300W

Other parameters

Supply voltage


Total power


Overall size


Total Weight

About 300kg

Disclaimer: The product introduction content (including product images, product descriptions, technical parameters, etc.) of this site is for reference only. As the update may not be timely, there will be some differences between the content and the actual situation. Please contact our sales staff to confirm. The information provided on this site does not constitute any offer or promise, and the company will improve and modify any information on the website from time to time without prior notice.

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  • E-mail: cysi@cysi.wang
  • Tel: +86 371 5519 9322
  • Fax: +86 371 8603 6875
  • Add: No. 820, 8th Floor, 1st Unit, 9th Block, Cuizhu Street, High-Tech Zone, Zhengzhou, Henan, China
  • Pakistan Distributor:
    NEO LFN CorpMicro Mega Solutions
    Address: Flat # 04,2nd Floor Sarwar Plaza Shamsabad Murree Road Rawalpindi.
    Tel:  +92 312 9892 35 33
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