This equipment is a double target magnetron sputter coater machine, which can be used in the preparation of metal films, in the fields of electronics, optics, special ceramics, etc.this double target magnetron sputter coater can also be used to prepare SEM samples in laboratory.
It adopts high vacuum stainless steel chamber, front door opening design, and quartz observation window on the door, which is convenient for the observation and recording of the experiment. At the same time, the equipment is equipped with a rotary heating sample table, which can effectively improve the film uniformity and film quality. A set of baffle plate is installed on the top cover, and the two targets can be switched by rotating the baffle plate to realize multilayer coating.
This equipment needs to be used together with high vacuum molecular pump group. Users can choose imported brand small molecular pump to further save installation area.
At the same time, the model can be equipped with film thickness meter components, which can monitor the film thickness in real time and provide reliable parameters for the experimental process.
double target magnetron sputter coater technical parameters:
product name | Desktop double head magnetron sputtering coating machine |
Product number | CY-MSZ180-I-RF-SS |
sample stage | Dimensions | φ100mm |
Heating temperature | ≦500℃ |
Adjustable speed | ≦20rpm |
Magnetic target gun | Equipped with a two-inch magnetic control target, target size: diameter 50.8mm, thickness ≦3mm |
vacuum chamber | Cavity size | φ180mm X215mm |
observation window | omnidirectionally transparent |
Cavity material | SUU304 stainless steel |
Opening method | Removable top cover |
Vacuum system | Backing pump | Low noise bipolar rotary vane pump |
Molecular pump | Low noise and high pumping speed turbomolecular pump |
Vacuum measurement | Composite vacuum gauge, range: 10-5~105Pa |
Air extraction interface | KF16 |
Air extraction interface | KF40 |
Exhaust interface | KF16 |
System vacuum | 1.0×10-4Pa |
Power supply | AC 220V 50/60Hz |
Pumping rate | The pumping speed of the molecular pump is 600L/s, and the pumping speed of the backing pump is 1.1L/s. |
Power configuration | Number of power supplies | A set of RF power supply |
Output Power | 500W |
Other parameters | Supply voltage | AC220V,50Hz |
Total power | 2kW |
Overall size | 550mm X 350mm X400mm |
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