Dual target upper sputtering DC RF magnetron sputtering coating machine
CY-MSP500S-DCRF-B is a special laboratory coating machine with two targets developed by our company. this magnetron sputtering coater machine is equipped with a DC power supply and a RF power supply. It can be used to prepare single or multi-layer ferroelectric thin films, conductive films, alloy films, semiconductor films, ceramic films, dielectric films, optical films, etc.
CY-MSP500S-DCRF-B is a special laboratory coating machine with two targets developed by our company. this magnetron sputtering coater machine is equipped with a DC power supply and a RF power supply. this magnetron sputtering coater machine can be used to prepare single or multi-layer ferroelectric thin films, conductive films, alloy films, semiconductor films, ceramic films, dielectric films, optical films, etc.
Features of magnetron sputtering coater:
a. Compared with the conventional plasma sputtering, magnetron sputtering has the advantages of high energy, high speed, high deposition rate and low sample temperature rise;
b. The magnetron target is equipped with water-cooled interlayer. The water cooler can effectively take away heat and avoid heat accumulation on the target surface, so that the magnetron coating can work stably for a long time;
c. This model adopts the layout of under target, the sample table is on the top, and the height with the target surface can be precisely adjusted by program, and can be rotated and heated, with excellent performance.
Technical parameters of magnetron sputtering coater:
Model
CY-MSP500S-DCRF-B
Input
AC220V，50Hz
Total power
6KW
Ultimate vacuum degree
5x10-4Pa
Sample table parameters
Size
150 Dia.
Height
70 mm adjustable
Heating
≤500℃
Rotation speed
1-20 rpm
Magnetron sputtering head parameters
Quantity
2-set，2-inch
Cooling mode
Water cooled，required flow rate10L/min
Water chiller
10L/min circulating water cooling
Vacuum chamber
Size
500mm Dia. × 490mm H
Material
Stainless steel
Watch window
100mm Dia.
Open mode
front opening door
Gas flow controller
1channel 200sccm Ar；
Vacuum pump
Molecular pump system pumping,600L/S
Film thickness gauge
Quartz vibrating film thickness gauge ，
one set，Resolution 0.10 Å
Sputter power supply
DC power supply：one set，500W，for metal films
RF power supply：one set，500W，for non-metallic films
Operating mode
All-in-one computer operation
Overall dimensions
1090mm x 900mm x 1250mm
Total weight
350kg
magnetron sputtering coater machine video:
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