Single target magnetron sputtering coater with tiltable sample stage
This equipment is a single-target magnetron sputtering coater with a tiltable sample stage. The angle between the sample stage and the target surface is adjustable, and it can be used to make films with specific growth angles. The appearance of the equipment is desktop level, which greatly reduces the installation site requirements.
This equipment is a single-target magnetron sputtering coater with a tiltable sample stage. The angle between the sample stage and the target surface is adjustable, and magnetron sputtering coater can be used to make films with specific growth angles. The appearance of the equipment is desktop level, which greatly reduces the installation site requirements. The equipment is equipped with a DC power supply, which can be used for sputtering of metal and other conductive materials. The vacuum system of the equipment adopts turbomolecular pump group, which has fast pumping speed, high ultimate vacuum degree and excellent vacuum performance. This equipment has a compact structure and perfect functions and is easy to use, and is very suitable for various coating tests.
magnetron sputtering coater technical parameters：
product name
single target magnetron sputtering coater with tiltable sample stage
Product number
CY-MSZ180-60Q-I-DC-Q
sample stage
Dimensions
φ60mm
Heating temperature
≦500℃
Adjustable speed
≦20rpm
Magnetic target gun
Equipped with a two-inch magnetic control target, target size: diameter 50.8mm, thickness ≦3mm
vacuum chamber
Cavity size
φ180mm X150mm
observation window
omnidirectionally transparent
Cavity material
High purity quartz
Lower flange
Contains sample stage tilt mechanism and rotation mechanism
Opening method
Removable top cover
Vacuum system
Backing pump
Low noise bipolar rotary vane pump
Molecular pump
Low noise and high pumping speed turbomolecular pump
Vacuum measurement
Composite vacuum gauge, range: 10-5~105Pa
Air extraction interface
KF16
Air extraction interface
KF40
Exhaust interface
KF16
System vacuum
1.0×10-4Pa
Power supply
AC 220V 50/60Hz
Pumping rate
The pumping speed of the molecular pump is 600L/s, and the pumping speed of the backing pump is 1.1L/s.
Power configuration
Number of power supplies
A set of DC power supply
Output Power
300W
Other parameters
Supply voltage
AC220V,50Hz
Total power
2kW
Overall size
550mm X 350mm X400mm
magnetron sputtering coater video:
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