Automatic program controlled high vacuum three target magnetron sputtering coating instrument for Oxide film

The three-target magnetron sputtering coating machine is a cost-effective magnetron sputtering coating equipment independently developed by our company, featuring standardization, modularization, and customization. The magnetron targets are available in 1 inch and 2 inches, allowing customers to purchase them freely according to the size of the coated substrate. It is equipped with a 500W DC power supply and a 500W RF power supply. The DC power supply can be used for the preparation of metal films, while the RF power supply is for the preparation of non-metal films. The three targets can meet the needs of multi-layer or multi-time coating. If customers have other coating requirements, other RF power supplies and pulse power supplies can be customized, with various specifications ranging from 300W to 1000W.

The coating machine is equipped with two high-precision mass flowmeters, and up to four mass flowmeter gas paths can be customized to meet the needs of complex gas environment construction. The instrument is equipped with an advanced turbo molecular pump group, which can achieve an ultimate vacuum of 1.0E-5Pa. At the same time, other types of molecular pumps are available for purchase. The gas path of the molecular pump is controlled by multiple solenoid valves, which can realize the opening of the chamber and the removal of samples without turning off the pump, greatly improving your work efficiency. This product can be equipped with an all-in-one industrial control computer for system control. Most functions such as the control of the vacuum pump group and the sputtering power supply can be realized on the computer program, further improving your experimental efficiency.

The three-target magnetron sputtering coating machine can be used to prepare single-layer or multi-layer ferroelectric films, conductive films, alloy films, semiconductor films, ceramic films, dielectric films, optical films, oxide films, hard films, polytetrafluoroethylene films, etc. Compared with similar equipment, the three-target magnetron sputtering coating machine not only has a wide range of applications but also is small in size and easy to operate, making it an ideal equipment for laboratory preparation of material films.

three target magnetron sputtering coating Technical Parameters：