Product name | PLD pulse laser deposition evaporation coating instrument |
Product model | CY-PLD-450 |
Main vacuum system | Sphere structure, size: dia. 450mm |
Loading sample system | Vertical cylindrical stucture, size: dia. 150×150mm |
Vacuum system configuration | Main vacuum chamber | Mechanical pump, molecular pump, valve |
Loading sample system | Mechanical pump and molecular pump(sharing with primary chamber), valve |
Ultimate pressure | Main vacuum system | ≤6*10-6Pa(after baking and degassing) |
Loading sample system | ≤6*10-3 Pa(after baking and degassing) |
Vacuum recovery system | Main vacuum system | It can reach 5x10-3Pa in 20 minutes (the system is exposed to the atmosphere for a short time and filled with dry nitrogen to start pumping) |
Loading sample system | It can reach 5x10-3Pa in 20 minutes (the system is exposed to the atmosphere for a short time and filled with dry nitrogen to start pumping) |
Rotating target platform | The maximum size of the target is about 60mm. Four target materials can be installed at one time, target changing in revolution motion; each target can rotate independently, rotation speed: 5-60 rpm |
Substrate heating platform | Sample size | Dia. 51 |
Mode of motion | Substrate rotates continuously, rotation speed:5-60 rpm |
Heating temperature | Maximum temperature of substrate heating: 800℃±1℃, Controlled and adjustable |
Gas circuit system | 1-circuit mass flow controller, 1-circuit inflation valve |
Optional accessories | Laser device | Compatible with coherent 201 laser |
Laser beam scanning device | 2D scanning mechanical platform, perform two degree of freedom scanning. |
Computer control system | The contents of control include common conversion target, target rotation, sample rotation, sample temperature control, laser beam scanning, etc. |
Floor Space | Main unit | 1800 * 1800mm2 |
Electric cabinet | 700 *700mm2(one) |
