Halogen lamp RTP vertical rapid annealing furnace
Halogen lamp RTP vertical rapid annealing furnace is a fast 8-inch piece of rapid annealing furnace, adopting innovative heating technology, which can realize the real substrate temperature measurement, and it does not need to adopt the traditional rapid annealing furnace temperature compensation, and it has temperature control precision, high temperature repeatability. Customers include many leading semiconductor companies and international scientific research team, which are ideal choices for the annealing process of semiconductor process.
Halogen lamp RTP vertical rapid annealing furnace is a fast 8-inch piece of rapid annealing furnace, adopting innovative heating technology, which can realize the real substrate temperature measurement, and it does not need to adopt the traditional rapid annealing furnace temperature compensation, and it has temperature control precision, high temperature repeatability. Customers include many leading semiconductor companies and international scientific research team, which are ideal choices for the annealing process of semiconductor process.
RTP vertical rapid annealing furnace technical parameter:
Substrate size | 8 inch |
Substrate base | Quartz needle (optional Si-C coated graphite base) |
Temperature range | 150-1250℃ |
Heating speed | 10-150℃/S |
Temperature uniformity | ≤±1.5% (@800℃, Silicon wafer) ≤±1.0% (@800℃, Substrate on Si-C coated graphite susceptor) |
Temperature control accuracy | ≤ ±3℃ |
Temperature repeatability | ≤ ±3℃ |
Vacuum degree | 5.0E-3 Torr / 5.0E-6 Torr |
Pneumatic supply | Standard 1-channel N2 purge and cooling air circuit, controlled by MFC (maximum 3 channels) |
Annealing duration | ≥35min@1250℃ |
Temperature control | Fast digital PID control |
Size | 900mm*650mm*1600mm |
