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High vacuum electron beam evaporation coating machine for Semiconductor thin filmHigh vacuum electron beam evaporation coating machine for Semiconductor thin filmHigh vacuum electron beam evaporation coating machine for Semiconductor thin filmHigh vacuum electron beam evaporation coating machine for Semiconductor thin film

High vacuum electron beam evaporation coating machine for Semiconductor thin film

    High vacuum electron beam evaporation coating machine is used by electron beam evaporation coating equipment, mainly used for the preparation of various conductive film, semiconductor film, ferroelectric film, optical film, micro-nano device microprocessing, electron microscope sample pretreatment, etc., especially suitable for evaporation of various refractory metal materials. It can be used not only for hard substrates such as glass wafers and silicon wafers, but also for coating on flexible substrates such as PDMS, PTFE and PI.

High vacuum electron beam evaporation coating machine is used by electron beam evaporation coating equipment, mainly used for the preparation of various conductive film, semiconductor film, ferroelectric film, optical film, micro-nano device microprocessing, electron microscope sample pretreatment, etc., especially suitable for evaporation of various refractory metal materials. It can be used not only for hard substrates such as glass wafers and silicon wafers, but also for coating on flexible substrates such as PDMS, PTFE and PI.

High vacuum electron beam evaporation coating machine

Technical parameters of electron beam evaporation coating:


Product name

Electron beam evaporation coating  mmachine

Product model

CY-EBH500-SS

Service condition

Ambient temperature ranged from 5 to 40

Source

Three phase 380V

Voltage

220V 50HZ

Power

<20 kW

Water gage

<2.5bar

Plated layer monitoring

Using SQM160 membrane thickness monitor,   the inhomogeneity of coating thickness is less than 6%.

Heat lamp

Four halogen heating lamps were used for   degassing and one neon lamp for lighting

The electrode interface

With a 2-way metal evaporation electrode   interface, backup

Water cooling system

Water pressure monitoring

Observation window

100mm in diameter, with X-ray filter   glass

Control system

Touch screen system

Vacuum chamber dimensions

Evaporation chamber dimensions: Φ 500 *   H500mm

Electron gun

New electronic gun, a 6-hole crucible

Sample turntable

Sample size: <150mm, the sample table   can rotate, the sample table surface and the electron gun surface distance   adjustment up and down, the adjustment distance is 200mm-250mm, the sample   table can be heated, heating temperature <500.

System vacuum degree

A. Limit vacuum: baking for 12~24 hours,   continuous pumping, vacuum less than 5x10-5Pa

B. Extraction rate: a vacuum <5x10 in   40 minutes, starting from the atmosphere-4Pa

C. System leakage rate: after 12 hours of   shutdown, measure the vacuum degree of the vacuum chamber is <10Pa

The vacuum unit

FB1200 Molecular pump + VRD-16 front   stage pump + side extraction valve + gate valve + cut-off valve + composite   vacuum meter + coating monitoring vacuum meter interface (standby)



Electron beam evaporation coater video:



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  • Tel: +86 371 5519 9322
  • Fax: +86 371 8603 6875
  • Add: No. 820, 8th Floor, 1st Unit, 9th Block, Cuizhu Street, High-Tech Zone, Zhengzhou, Henan, China




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