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Desktop bottom-target magnetron sputtering coater for SEM sampleDesktop bottom-target magnetron sputtering coater for SEM sampleDesktop bottom-target magnetron sputtering coater for SEM sampleDesktop bottom-target magnetron sputtering coater for SEM sampleDesktop bottom-target magnetron sputtering coater for SEM sample

Desktop bottom-target magnetron sputtering coater for SEM sample

    Desktop bottom-target magnetron sputtering coater is a desktop single-target magnetron sputtering coater,it can be used in the preparation of metal film,and also used in electronic fields,optical fields,special field of ceramic preparation,it surely can be used in SEM sample preparation in laboratory.


Desktop bottom-target magnetron sputtering coater is a desktop single-target magnetron sputtering coater,it can be used in the preparation of metal film,and also used in electronic fields,optical fields,special field of ceramic preparation,it surely can be used in SEM sample preparation in laboratory.

Desktop bottom-target magnetron sputtering coater

magnetron sputtering coater Structure setting:

This magnetron sputtering coater is equipped with high vacuum stainless steel cavity, the cavity is set with a quartz observation window baffle, which is easy to observe and record the experiment; The cavity design with excellent vacuum performance and small shape makes it very suitable for laboratory use. 

The equipment adopts the design of bottom-target, compared with the upper-target, this design can better avoid the problem of film fragments falling off due to the long time coating of the shielding cover, and can protect the sample more effectively. 

At the same time, the equipment is equipped with a rotating heating sample table, which can effectively improve the film uniformity and film quality. The machine adopts modular design, simple operation logic, and intuitive operation interface, easy to get started.

magnetron sputtering coater technical parameter:

Product Name

Desktop bottom-single-target sputtering coater with stainless steel   cavity

Product Model

CY-MSZ190-1-DC-SS    (under)

Installation Condition

1,Working environment temperature: 25℃±15℃,humidity: 55%Rh±10%Rh;

2,Equipment power supply:AC220V,50Hz, must be well grounded;

3,Rated power:1000w;

4,Equipment for gas:The equipment chamber should be filled with argon gas for cleaning.   The customer should prepare argon gas with purity ≥99.99%.

5,Table size requirements: 600mm×600mm×700mm,bearing capacity ≥ 50kg;

6,The position should be well ventilated and cooled.

Technical Indicators

1、 Sputtering power supply:DC power supply 300W;maximum output voltage   600V,limited   current output 500mA

2、 Magnetron target:2 inch balance target,magnetic coupling baffle;

3、 Suitable target material: φ50mm x 3mm in thickness

4、 Cavity size :outside   diameter194,inside diameter186mm x height 230mm

5、 Cavity material: 304 stainless steel

6、 Rotating heating sample   table:rotate   speed 1~20rpm  continuously adjustable;maximum heating   temperature 500℃,the lowest recommended   heating rate 10℃/min,the highest recommended   heating rate 20℃/min.

7、 Cooling mode :magnetic target and   molecular pump require circulating water cooler

8、 Water-cooling machine:the tank volume 9L,flow rate 10L/min

9、 Gas supply system:mass flow meter, type of gas Argon,flow 1~30sccm(customizable)

10、 Accuracy of flow meter :±1.5% measuring range

11、 The air pumping interface   of the vacuum chamber is KF25

12、 Air intake interface is   1/4 inch double ferrule joint

13、 Touch screen is 7inch   color touch screen

14、 Adjustable sputtering   current,sputtering   safety current value and safety vacuum value can be set;

15、  safety protection: over current, vacuum is too low   automatically cut off the sputtering current

16、 Ultimate vacuum:5E-4Pa(matching molecular   pump);

17、 Vacuum   measurement is Parana vacuum gauge,the range is:1~105Pa

Notice

1,Magnetron sputtering   has a high working vacuum, generally within 2Pa, and needs to be used with   molecular pump. 

2,In order to achieve a   high oxygen free environment, the vacuum chamber should be cleaned at least 3   times with high purity inert gas。

3,Magnetron sputtering is   sensitive to the air intake, so mass flow meter is needed to control the air   intake

Optional   accessory

Film

thickness   Monitor

1,Film thickness   resolution:0.0136Å(aluminum)

2,Accuracy of film   thickness :±0.5%,it depends on process   conditions, especially sensor position, material stress, temperature and   density  

3,Measuring speed:100ms-1s/times,measurement range can be   set :500000Å(aluminum)

4,Standard sensor crystal:6MHz

5,Suitable for wafer   frequency:6MHz  

suitable for wafer size:Φ14mm

mounting   flange:CF35

Another Accessory

·            1,CY-CZK103 series high performance   molecular pump set(including composite vacuum gauge, measuring range   10-5Pa~105Pa)

CY-GZK60 series small molecular pump set(including composite vacuum gauge, measuring range   10-5Pa~102Pa)

VRD-4 bipolar rotary vane   vacuum pump

2,KF25   Vacuum bellows; The length can be 0.5m, 1m or 1.5m. KF40 clamp bracket

3,Film thickness meter   crystal oscillator;


 


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  • Add: No. 820, 8th Floor, 1st Unit, 9th Block, Cuizhu Street, High-Tech Zone, Zhengzhou, Henan, China




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