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Desktop single-target magnetron sputtering coater with stainless steel cavityDesktop single-target magnetron sputtering coater with stainless steel cavityDesktop single-target magnetron sputtering coater with stainless steel cavity

Desktop single-target magnetron sputtering coater with stainless steel cavity

    This equipment is a single-target magnetron sputtering coater,it can be used in the preparation of metal film,and also used in electronic fields,optical fields,special field of ceramic preparation ,it surely can be used in SEM sample preparation in laboratory

This equipment is a single-target magnetron sputtering coater,it can be used in the preparation of metal film,and also used in electronic fields,optical fields,special field of ceramic preparation ,it surely can be used in SEM sample preparation in laboratory。

Desktop single-target magnetron sputtering coater with stainless steel cavity

magnetron sputtering coater Structure setting:

This set is single-target magnetron sputtering coater equipped with high vacuum stainless steel cavity, the cavity is set with a quartz observation window baffle, which is easy to observe and record the experiment; The cavity design with excellent vacuum performance and small shape makes it very suitable for laboratory use. At the same time, the equipment is equipped with a rotating heating sample table, which can effectively improve the film uniformity and film quality. The machine adopts modular design, simple operation logic, and intuitive operation interface, easy to get started.  

single-target magnetron sputtering coater technical parameter:

 

Product Name

Desktop single-target magnetron   sputtering coater with stainless steel cavity

Product Model

CY-MSP190S-1T-A

Installation Condition

1,Working environment temperature: 25±15,humidity: 55%Rh±10%Rh

2,Equipment power supplyAC220V,50Hz, must be well grounded

3,Rated power1000w

4,Equipment for gasThe equipment chamber should be filled with argon gas for cleaning.   The customer should prepare argon gas with purity ≥99.99%.

5,Table size requirements: 600mm×600mm×700mm,bearing capacity ≥ 50kg

6,The position should be well ventilated and cooled.

Technical Indicators

1、 Sputtering power supplyDC power supply 300Wmaximum output voltage   600V,limited current output 500mA

2、 Magnetron target2 inch balance target,magnetic   coupling baffle

3、 Suitable target material φ50mm x 3mm in thickness

4、 Cavity size outside   diameter194,inside diameter186mm x height 230mm

5、 Cavity material 304 stainless steel

6、 Rotating heating sample   tablerotate   speed 1~20rpm  continuously adjustablemaximum heating   temperature 500,the   lowest recommended heating rate 10/min,the   highest recommended heating rate 20/min.

7、 Cooling mode magnetic target and   molecular pump require circulating water cooler

8、 Water-cooling machinethe tank volume 9L,flow   rate 10L/min

9、 Gas supply systemmass flow meter, type of   gas Argon,flow 1~30sccmcustomizable

10、 Accuracy of flow meter ±1.5% measuring range

11、 The air pumping interface   of the vacuum chamber is KF25

12、 Air intake interface is   1/4 inch double ferrule joint

13、 Touch screen is 7inch   color touch screen

14、 Adjustable sputtering   current,sputtering safety current value and safety vacuum value can be set

15、  safety protection: over current, vacuum is too low   automatically cut off the sputtering current

16、 Ultimate vacuum5E-4Pa(matching molecular   pump)

17、 Vacuum   measurement is Parana vacuum gauge ,the range is1105Pa

Notice

1,Magnetron sputtering   has a high working vacuum, generally within 2Pa, and needs to be used with   molecular pump. 

2,In order to achieve a   high oxygen free environment, the vacuum chamber should be cleaned at least 3   times with high purity inert gas

3,Magnetron sputtering is   sensitive to the air intake, so mass flow meter is needed to control the air   intake

Optional accessory

Film

thickness Monitor

1,Film thickness   resolution0.0136Åaluminum

2,Accuracy of film   thickness ±0.5%,it   depends on process conditions, especially sensor position, material stress,   temperature and density  

3,Measuring speed100ms-1s/times,measurement   range can be set 500000Åaluminum

4,Standard sensor crystal6MHz

5,Suitable for wafer   frequency6MHz  

suitable for wafer sizeΦ14mm

mounting flangeCF35

Another Accessory

·             1,CY-CZK103 series high performance   molecular pump set(including composite vacuum gauge, measuring range   10-5Pa~105Pa)

CY-GZK60 series small molecular pump set(including composite vacuum gauge, measuring range   10-5Pa~102Pa)

VRD-4 bipolar rotary vane   vacuum pump

2,KF25 Vacuum bellows;   The length can be 0.5m, 1m or 1.5m. KF40 clamp bracket

3,Film thickness meter   crystal oscillator;


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  • E-mail: cysi@cysi.wang
  • Tel: +86 371 5519 9322
  • Fax: +86 371 8603 6875
  • Add: No. 820, 8th Floor, 1st Unit, 9th Block, Cuizhu Street, High-Tech Zone, Zhengzhou, Henan, China




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