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Desktop single-target magnetron sputtering coater for SEM sampleDesktop single-target magnetron sputtering coater for SEM sampleDesktop single-target magnetron sputtering coater for SEM sampleDesktop single-target magnetron sputtering coater for SEM sampleDesktop single-target magnetron sputtering coater for SEM sample

Desktop single-target magnetron sputtering coater for SEM sample

    This equipment is a desktop single-target magnetron sputtering coaterit can be used in the preparation of metal filmand also used in electronic fields,optical fields,special field of ceramic preparation.

This equipment is a desktop single-target magnetron sputtering coater,it can be used in the preparation of metal film,and also used in electronic fields、optical fields、special field of ceramic preparation ,it surely can be used in SEM sample preparation in laboratory。

magnetron sputtering coater

This desktop single-target magnetron sputtering coater equipment adopts quartz vacuum chamber,and the coating process is Omni-visible,which is easy to observe and record the experiment .The cavity design is easy to open, easy to clean, and very suitable for laboratory use. At the same time, the equipment is equipped with a rotating heating sample table, which can effectively improve the film uniformity and film quality. The machine adopts modular design, simple operation logic, intuitive operation interface, easy to get started.

magnetron sputtering coater technical parameter:

Product Name

Desktop single-target magnetron sputtering coater

Product Model

CY-MSP180G-1T-A

Installation Condition

1Working environment   temperature: 25±15℃,humidity: 55%Rh±10%Rh

2Equipment power supplyAC220V50Hz must be well grounded

3Rated power1000w

4Equipment for gasThe equipment chamber   should be filled with argon gas for cleaning. The customer should prepare argon   gas with purity ≥99.99%.

5Table size requirements:   600mm×600mm×700mmbearing   capacity ≥ 50kg

 6The position should be well   ventilated and cooled.

Technical Indicators

1、 Sputtering power supplyDC power supply 300Wmaximum output voltage 600Vlimited current output 500mA

2、 Magnetron target2 inch balance targetmagnetic coupling baffle

3、 Suitable target material φ50mm x 3mm in thickness

4、 Cavity size φ180mm x 200mm

5、 Cavity material high   purity quartz

6、 Rotating heating sample   tablerotate   speed 1~20rpm  continuously adjustablemaximum heating   temperature 500the lowest recommended   heating rate 10/minthe highest recommended   heating rate 20/min.

7、 Cooling mode magnetic target and   molecular pump require circulating water cooler

8、 Water-cooling machinethe tank volume 9Lflow rate 10L/min

9、 Gas supply systemmass flow meter type of   gas Argonflow   1~30sccmcustomizable

10、 Accuracy of flow meter ±1.5% measuring range

11、 The air pumping interface   of the vacuum chamber is KF25

12、 Air intake interface is   1/4 inch double ferrule joint

13、 Touch screen is 7inch   color touch screen

14、 Adjustable sputtering   currentsputtering   safety current value and safety vacuum value can be set

15、  safety   protection: over current, vacuum is too low automatically cut off the   sputtering current

16、 Ultimate vacuum5E-4Pa(matching molecular   pump)

17、 Vacuum   measurement is Parana vacuum gauge the range is1105Pa

Notice

1Magnetron sputtering has   a high working vacuum, generally within 2Pa, and needs to be used with   molecular pump. 

2In order to achieve a   high oxygen free environment, the vacuum chamber should be cleaned at least 3   times with high purity inert gas

3Magnetron sputtering is   sensitive to the air intake, so mass flow meter is needed to control the air   intake  

Optional   accessory

Film

thickness   Monitor

1Film thickness resolution0.0136Åaluminum

2Accuracy of film   thickness ±0.5%it depends on process   conditions, especially sensor position, material stress, temperature and   density  

3Measuring speed100ms-1s/timesmeasurement range can be   set 500000Åaluminum

4Standard sensor crystal6MHz

5Suitable for wafer frequency6MHz

suitable for wafer sizeΦ14mm

mounting flangeCF35

Another Accessory

·             1CY-CZK103   series high performance molecular pump set(including composite vacuum gauge,   measuring range 10-5Pa~105Pa)

CY-GZK60 series small molecular pump set(including composite vacuum gauge, measuring range   10-5Pa~102Pa)

VRD-4 bipolar rotary vane   vacuum pump

2KF25 Vacuum bellows; The   length can be 0.5m, 1m or 1.5m. KF25 clamp bracket

3Film thickness meter   crystal oscillator;

4Stainless steel   fine-tuning valve (only suitable for low coating requirements)

 


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