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Desktop Dual-Target Magnetron Sputtering Coating Instrument IntroductionDesktop Dual-Target Magnetron Sputtering Coating Instrument IntroductionDesktop Dual-Target Magnetron Sputtering Coating Instrument IntroductionDesktop Dual-Target Magnetron Sputtering Coating Instrument IntroductionDesktop Dual-Target Magnetron Sputtering Coating Instrument Introduction

Desktop Dual-Target Magnetron Sputtering Coating Instrument Introduction

    This equipment is a dual-target magnetron sputtering coating system dedicated to the fabrication of metal thin films


This equipment is a dual-target magnetron sputtering coating system dedicated to the fabrication of metal thin films. It is widely applied in electronics, optics, special ceramic synthesis, and SEM sample preparation for laboratory research.

The system adopts a high-vacuum stainless steel chamber equipped with a quartz viewing window with baffles to facilitate real-time observation and recording of experiments. Featuring outstanding vacuum performance and a compact footprint, it is perfectly suited for laboratory environments. A rotatable heating sample stage is integrated to significantly improve thin-film uniformity and coating quality. The whole machine adopts a modular design with intuitive operation logic and a user-friendly interface for easy operation.

Technical Parameters of Dual-Target Magnetron Sputtering Coating Instrument:

Product Name

Desktop Stainless Steel Chamber Dual-Target Magnetron Sputtering Coating Instrument

Product  Model

CY-MSZ273-II-DC-SS

Sample Stage – Overall Dimension

φ100 mm

Sample Stage – Adjustable Rotation Speed

≤20 rpm

Magnetron Gun

Two 2-inch magnetron targets; Target dimension: Diameter 50.8 mm, Thickness ≤3 mm

Vacuum Chamber – Chamber Size

φ273 mm × 280 mm

Vacuum Chamber – Viewing Window

Front-mounted

Vacuum Chamber – Material

304 Stainless Steel

Vacuum Chamber – Opening Method

Top cover opening + front door opening

Vacuum System – Fore Pump

Low-noise two-stage rotary vane pump

Vacuum System – Turbo Molecular Pump

Low-noise high-pumping-speed turbo molecular pump (optional)

Vacuum System – Vacuum Gauge

Composite vacuum gauge

Vacuum System – Pumping Port

KF16

Vacuum System – Exhaust Port

KF16

Sputtering Working Vacuum

DC mode: 0.3 Pa; RF mode: 3 Pa

Power Supply Input

AC 220 V, 50/60 Hz

Fore Pump Pumping Speed

1.1 L/s

Power Configuration – Power Supply Quantity

1 set of DC power supply

Power Configuration – Output Power

DC power supply: 500 W

Miscellaneous Parameters – Input Voltage

AC 220 V, 50 Hz

Miscellaneous Parameters – Total Machine Power

2 kW

Miscellaneous Parameters – Overall Machine Dimension

440 mm × 600 mm × 775 mm


Contact Us
  • E-mail: cysi@cysi.wang
  • Tel: +86 371 5519 9322
  • Fax: +86 371 8603 6875
  • Add: No. 820, 8th Floor, 1st Unit, 9th Block, Cuizhu Street, High-Tech Zone, Zhengzhou, Henan, China




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