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Desktop Aluminum Alloy Chamber Single-Target Magnetron Sputtering Coating SystemDesktop Aluminum Alloy Chamber Single-Target Magnetron Sputtering Coating SystemDesktop Aluminum Alloy Chamber Single-Target Magnetron Sputtering Coating SystemDesktop Aluminum Alloy Chamber Single-Target Magnetron Sputtering Coating SystemDesktop Aluminum Alloy Chamber Single-Target Magnetron Sputtering Coating System

Desktop Aluminum Alloy Chamber Single-Target Magnetron Sputtering Coating System

    The desktop aluminum alloy chamber single-target magnetron sputtering coating system is a compact thin-film deposition device that utilizes magnetron sputtering technology to deposit thin films on substrate surfaces. Its key features include

The desktop aluminum alloy chamber single-target magnetron sputtering coating system is a compact thin-film deposition device that utilizes magnetron sputtering technology to deposit thin films on substrate surfaces. Its key features include: 

Aluminum Alloy Vacuum Chamber: Lightweight design with excellent corrosion resistance, suitable for laboratory or small-scale production environments. 

Single-Target Configuration: Supports a single target material (e.g., metal, alloy, or oxide), featuring a simple structure and user-friendly operation. 

Magnetron Sputtering Technology: Employs a magnetic field to confine plasma, enhancing sputtering efficiency and producing uniform, dense films. 

Desktop Design: Compact size, ideal for research institutes, university laboratories, and other space-limited settings. 

Applications: 

This system is widely used in materials science, optics, electronics, and other fields, including: 

Optical Thin Films: Such as anti-reflection coatings, reflective films, and optical filters. 

Electronic Devices: Semiconductor electrodes, conductive films (e.g., ITO), and sensor coatings. 

Functional Materials: Wear-resistant coatings (e.g., TiN), anti-corrosion coatings, and superhard films (e.g., diamond-like carbon). 

Scientific Research: New material development, thin-film performance testing, and educational demonstrations. 

Technical Parameters:

Product name

Desktop aluminum alloy chamber single target magnetron sputtering coater

Product model

CY-MSZ200-I-DC-AL

Sample table

Dimensions

φ50mm

Rotation

Rotation + revolution angle tilt 2 inches

Adjustable speed

20rpm

Magnetron target gun

Equipped with a two-inch magnetron target, target size: diameter 50.8mm,   thickness 3mm

Vacuum chamber

Cavity size

φ180mm X 150mm

Cavity material

Aluminum alloy

Opening method

Removable cover

Vacuum system

Vacuum measurement

Compound vacuum gauge, range: 10-5~105Pa

Vacuum extraction interface

KF25

System vacuum

1.0E-1Pa (mechanical pump)

Power supply

AC 220V 50/60Hz

Output power

DC power supply 500W

 

Other parameters

Power supply voltage

AC220V,50Hz

Total power

2kW

Weight

30kg

Machine size

385X450X420mm

 


Contact Us
  • E-mail: cysi@cysi.wang
  • Tel: +86 371 5519 9322
  • Fax: +86 371 8603 6875
  • Add: No. 820, 8th Floor, 1st Unit, 9th Block, Cuizhu Street, High-Tech Zone, Zhengzhou, Henan, China




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