The desktop aluminum alloy chamber single-target magnetron sputtering coating system is a compact thin-film deposition device that utilizes magnetron sputtering technology to deposit thin films on substrate surfaces. Its key features include
The desktop aluminum alloy chamber single-target magnetron sputtering coating system is a compact thin-film deposition device that utilizes magnetron sputtering technology to deposit thin films on substrate surfaces. Its key features include:
Aluminum Alloy Vacuum Chamber: Lightweight design with excellent corrosion resistance, suitable for laboratory or small-scale production environments.
Single-Target Configuration: Supports a single target material (e.g., metal, alloy, or oxide), featuring a simple structure and user-friendly operation.
Magnetron Sputtering Technology: Employs a magnetic field to confine plasma, enhancing sputtering efficiency and producing uniform, dense films.
Desktop Design: Compact size, ideal for research institutes, university laboratories, and other space-limited settings.
Applications:
This system is widely used in materials science, optics, electronics, and other fields, including:
Optical Thin Films: Such as anti-reflection coatings, reflective films, and optical filters.
Electronic Devices: Semiconductor electrodes, conductive films (e.g., ITO), and sensor coatings.
Functional Materials: Wear-resistant coatings (e.g., TiN), anti-corrosion coatings, and superhard films (e.g., diamond-like carbon).
Scientific Research: New material development, thin-film performance testing, and educational demonstrations.
Technical Parameters:
Product name | Desktop aluminum alloy chamber single target magnetron sputtering coater | |
Product model | CY-MSZ200-I-DC-AL | |
Sample table | Dimensions | φ50mm |
Rotation | Rotation + revolution angle tilt 2 inches | |
Adjustable speed | ≦20rpm | |
Magnetron target gun | Equipped with a two-inch magnetron target, target size: diameter 50.8mm, thickness ≦3mm | |
Vacuum chamber | Cavity size | φ180mm X 150mm |
Cavity material | Aluminum alloy | |
Opening method | Removable cover | |
Vacuum system | Vacuum measurement | Compound vacuum gauge, range: 10-5~105Pa |
Vacuum extraction interface | KF25 | |
System vacuum | 1.0E-1Pa (mechanical pump) | |
Power supply | AC 220V 50/60Hz | |
Output power | DC power supply 500W | |
Other parameters | Power supply voltage | AC220V,50Hz |
Total power | 2kW | |
Weight | 30kg | |
Machine size | 385X450X420mm |
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