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Dual chamber pulse laser coater

Dual chamber pulse laser coater

    Dual chamber pulse laser coater consists of vacuum chamber (main sputtering chamber, sample inlet chamber), sample transfer mechanism, sample frame, rotating target table, vacuum exhaust, vacuum measurement, electrical control, gas distribution, computer control and other parts.

Dual chamber pulse laser coater is used for growing optical crystals, ferroelectrics, ferromagnets, superconductors and organic compound thin film materials, suitable for growing high melting point, multi-elements and complex layered superlattice thin film materials containing gas elements. It is widely used in the research and manufacture of thin film materials in colleges and universities.

Dual chamber pulse laser coater specifications:

Main vacuum system

Sphere structure, size: dia. 450mm

Loading sample system

Vertical cylindrical stucture, size: dia. 150×150mm

Vacuum system configuration

Main vacuum chamber

Mechanical pump, molecular pump, valve

Loading sample system

Mechanical pump and molecular pump(sharing with primary chamber), valve

Ultimate pressure

Main vacuum system

≤6*10-6Pa(after baking and degassing)

Loading sample system

≤6*10-3 Pa(after baking and degassing)

Vacuum recovery  system

Main vacuum system

It can reach 5x10-3Pa in 20 minutes (the system is exposed to the atmosphere for a short time and   filled with dry nitrogen to start pumping)

Loading sample   system

It can reach 5x10-3Pa in 20 minutes (the system is exposed to the atmosphere for a short time and   filled with dry nitrogen to start pumping)

Rotating target platform

The maximum size of the target is about 60mm. Four target materials can be installed at one time, target changing in revolution motion; each target can rotate independently, rotation speed: 5-60 rpm

Substrate heating platform

Sample size

Dia. 51

Mode of motion

Substrate rotates continuously, rotation speed:5-60 rpm

Heating temperature

Maximum temperature of substrate heating: 800℃±1℃, Controlled and adjustable

Gas circuit system

1-circuit mass flow controller, 1-circuit inflation valve

Optional accessories

Laser device

Compatible with coherent 201 laser

Laser beam scanning device

2D scanning mechanical platform, perform two degree of freedom scanning.

Computer control system

The contents of control include common conversion target, target rotation, sample rotation, sample temperature control, laser beam scanning, etc.

Floor Space

Main unit

1800 * 1800mm2

Electric cabinet

700 *700mm2(one)


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  • Tel: +86 371 5519 9322
  • Fax: +86 371 8603 6875
  • Add: No. 820, 8th Floor, 1st Unit, 9th Block, Cuizhu Street, High-Tech Zone, Zhengzhou, Henan, China




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