Electron beam evaporation coating system
Electron beam evaporation coating system is mainly composed of evaporation vacuum chamber, e-type electron gun, thermal evaporation electrode, rotary substrate heating platform, working air path, exhaust system, vacuum measurement, electronic control system and installation machine platform.
Electron beam evaporation coating system is used for preparing conductive film, semiconductor film, ferroelectric film, optical film, etc. It is widely used in colleges and universities, scientific research institutions and small batch production.
Electron beam evaporation coating system specifications:
Structure | U-box front opening vacuum chamber, rear-mounted pumping system |
Vacuum chamber | 500×500×600mm2 |
Vacuum system configuration | Compound molecular pump, mechanical pump, gate valve |
Ultimate pressure | ≤6. 67×10-5Pa (after baking and degassing) |
Vacuum recovery system | It can reach 6.67×10-4pa in 45 minutes (after the system is exposed to the atmosphere for a short time and is filled with dry nitrogen) |
Electron beam evaporation source | E type electron gun | Anode voltage: 6kv、8kv; |
Quantity (set) | 1 |
Crucible | Water-cooled crucible, four point design, each capacity of 11ml |
Power | 0~6 KW adjustable |
Resistance evaporation source (optional) | Voltage | 5, 10V |
Power | Current 300A，the maximum output 3kw |
Quantity | One set, Switchable |
Water cooling electrode | Three roots, make up two evaporation boats |
Type and size of workpiece frame | Substrate size: compatible with 4″substrate Max substrate heating temperature 800℃±1℃ Substrate rotates continuously, rotation speed:5-60 rpm The distance between the substrate and the evaporation source is adjustable from 300 to 350mm Manually controlled sample baffle assembly: 1 set |
Gas circuit system | 1-circuit 200SCCM mass flow controller |
Quartz crystal oscillation film thickness controller | Thickness monitoring range: 0~99u9999A; |
Floor Space | Main Set | 900×800mm2 |
Electrical Cabinet | 800×800mm2 (two) |
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