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Compact DC Magnetron Sputtering Coater for Noble Metal Coating Compact DC Magnetron Sputtering Coater for Noble Metal Coating Compact DC Magnetron Sputtering Coater for Noble Metal Coating

Compact DC Magnetron Sputtering Coater for Noble Metal Coating

    Compact DC magnetron sputtering coater is a desktop magnetron plasma sputtering coater with a 2" target head, height adjustable sample holder. Especially suit for coating conductive gold film for SEM sample. It is a compact plasma sputtering coater designed for metallic coatings, such as gold, platinum, and silver. One 2" gold (4N) target is included.

Compact DC magnetron sputtering coater is designed to make some metal films,the film area can be up to 4 inches.It has a 2 inch size and the height between the sample stage and the sputter head can be adjusted between 30 and 80 mm. A manually operable sputter baffle is installed for pre-sputtering. The sputtering time of the sputtering head can be adjusted between 1 and 120 s. If you want a thin film, the sputtering time can be set shorter; if you want a thick film, the sputtering time can be longer.The device is small in size and cost-effective. It is an ideal coating equipment for making various metal films. It can be equipped with various metal targets and vacuum pump.

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Compact DC magnetron sputtering coater specifications:

Feature

1.Specially Designed for coating conductive gold film for SEM sample.

2.Compact   plasma sputtering coater designed for metallic coatings, such as gold,   platinum, and silver.

3.One   2" gold (4N) target is included.

Input Voltage

  • 220 VAC 50/60Hz, 200W

  • < 1000 W (including vacuum pump power)

  • 110VAC power is available by using a 1000 W transformer (15 A fuse). The transformer is sold separately.

Output Voltage

500 VDC

Sputtering current

  • 0 - 50 mA (max.) adjustable sputtering current

  • Digital current meter (mA)

  • Over-current protection

Sputtering time

1 -120   seconds adjustable

Specimen Chamber

Quartz   glass tube, 165 mm OD.×150 mm ID×150 mm Height

Specimen Stage

2"   diameter,height adjustable, 30 - 80 mm from the sample to the target

Sputtering   Head

2"   magnetron sputtering head.One manually operated shutter for target   protection.

Vacuum Pressure

  • Digital vacuum pressure meter (Pa)

  • KF25 vacuum pump connector

  • Ultimate vacuum pressure 1 Pa by the mechanical pump. The Pump is not included.

Input gas

  • One 1/4 Swagelok type tube fitting is installed for connecting the inert gas cylinder.

  • One metering valve is in the front panel for adjusting the input gas.

Target

  • One 50mm Dia. x 0.12mm gold target is included.  

  • 4N purity gold  foil: 50 mm(2 inch) Dia. x 0.12 mm (Included and pre-installed on coater) 

  • Optional Targets are available

Au target (50 mm Dia.×0.12   mm, 4N purity) 

Pt target (50 mm Dia.×0.12   mm, 4N purity)  

Ag target (50 mm Dia.×0.5 mm,   4N purity) 

This model is suitable for coating Gold, Sliver, Platinium. And it is not suitable for coating light metallic material such as Al, Mg,   Zn, or Carbon target due to low energy.  Please consider our high power DC/RF magnetron sputtering coater or thermal evaporation coater.  

Product Dimension and weight

L 460 mm×W 330 mm×H 520 mm

20kg

Warranty

One year limited with lifetime support

Contact Us
  • E-mail: cysi@cysi.wang
  • Tel: +86 371 5519 9322
  • Fax: +86 371 8603 6875
  • Add: No. 820, 8th Floor, 1st Unit, 9th Block, Cuizhu Street, High-Tech Zone, Zhengzhou, Henan, China
  • Korea Distributor:
    NEO LFN Corp
    Email:info@neolfn.com
    Tel:+82-31-999-4944
    Contact:Haeseop Kim
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