Combinatorial plasma sputtering coater has three 2'' magnetron sputtering sources and three RF/DC power supplies. Such a sputtering system is capable of co-sputtering up to three different target materials and create various composition profiles across the substrate (e.g. ternary materials for Li-ion rechargeable battery).
Combinatorial plasma sputtering coater is also suitable for sequential coating of multiple layer films such as ferroelectric, alloy, semiconductor, ceramic, dielectric, optical, oxide, hard, PTFE, etc.Compared with similar equipment, it is not only widely used, but also has the advantages of small size and easy operation. It is an ideal equipment for laboratory preparation of material films, especially suitable for laboratory research on solid electrolytes and OLEDs.
Magnetron Sputtering Head
Gas Flow Control
Vacuum Pump Station
One digital temperature controlled recirculating water chiller is included.
Lid closed: 48" × 28" × 32"
Lid open: 48" × 28" × 37"
Net Weight of Coater
One years limited warranty with lifetime support