Two zones CSS furnace with rotating wafer holder is an advanced rapid thermal processing furnace with 11" OD quartz chamber and 5"×5" rotating sample holder. It is designed for CSS (Close Spaced Sublimation) film coating up to 5" circular or square wafer samples at working temperature of 800°C Max.
Two zones CSS furnace with rotating wafer holder is heated by two group of halogen heaters (Top and Bottom) separately with max. 10ºC/s heating rate. The top sample holder is rotatable to achieve high uniformity coating. It is an excellent tool to research new generation thin film for solar cells, such as CdTe, Sulfide, and Perovskite solar cell.
Heater and Sample Holder
Maximum temperature for each heater: ≤ 800ºC.
Maximum temperature difference between two heaters: ≤ 300℃ depends on the spacing between two heaters:
Spacing 30mm Max. temp difference: 315℃ heating bottom only
Heating & Cooling Rate
Heating: < 8℃/s ( heating single heater only)
Cooling: < 10℃/s (600 - 100℃) Max.
Two K-type thermal couples are installed on top and bottom heaters separately.
208 - 240VAC, single phase, 50A air breaker
10 KW total
One year limited with lifetime support (Consumable parts such as quartz tube and heating lamps are not covered by the warranty).
The tube furnaces with quartz tube are designed for using under vacuum and low pressure < 0.2 bars / 3 psi / 0.02 Mpa. Vacuum pressures may only be safely used up to 1000°C. The flow rate for gasses should be limited to < 200 SCCM (or 200 ml/min) for reducing thermal shocks to the tube.