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High vacuum magnetron sputtering coater

High vacuum magnetron sputtering coater

    High vacuum magnetron sputtering coater is mainly composed of sputtering vacuum chamber, magnetron sputtering target, substrate water-cooled heating revolution table, working gas path, pumping system, installation machine, vacuum measurement and electronic control system.

High vacuum magnetron sputtering coater is used for the preparation of novel thin film materials such as nanometer single-layer and multi-layer functional film, hard film, metal film, semiconductor film and dielectric film. It can be widely used in the research of thin film materials and the production of small batch. It can be widely used in universities and colleges, scientific research institutes of thin film materials preparation research and small batch.

High vacuum magnetron sputtering coater specifications:

Vacuum chamber

Piriform vacuum chamber, size: dia. 450×350mm

Vacuum system configuration

Compound molecular pump, mechanical   pump, gate valve

ultimate pressure

2.0*10-5Pa(After baking degassing)

Vacuum recovery time

Up to 6.6*10-4Pa in 40 minutes. (the system briefly exposes the atmosphere and fills with dry nitrogen to start   pumping)

Magnetron target component

5 sets of permanent magnetic targets; target   sizeØ60mm(one of the targets can sputtering ferromagnetic material). The RF   beach   and DC cutoff of each target   are compatible.; and the distance between target and sample is adjustable   from 90mm to 130mm.

Water-cooling Substrate Heating Revolution Table

Substrate structure

Six stations, heating furnace installed   at one of these stations, and the others are water cooling substrate station.

Sample size

Ø30mm, 6 pieces can be placed

Mode of motion

0~360, reciprocating rotary


Max. Temperature 600℃±1℃

Substrate Negative Bias


Gas Circuit System

2-circuit mass flow controller

Computer Control System

Control sample rotation, baffle switch,   target identification, etc

Floor Space

Main Machine


Electrical Cabinet


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