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CYKY-300-1HD single target magnetron sputtering coater CYKY-300-1HD single target magnetron sputtering coater CYKY-300-1HD single target magnetron sputtering coater

CYKY-300-1HD single target magnetron sputtering coater

    Single target magnetron sputtering coater is equipped with a magnetron sputtering target with a water-cooled interlayer, a 140mm heatable rotating stage, and a DC power supply. The vacuum chamber adopts the top opening method, which makes it easier to change the target. It is an ideal device for making various metal films.


CYKY-300-1HD single target magnetron sputtering coater is a high vacuum coating equipment independently developed by our company. It can be used to prepare monolayer or multi-layer ferroelectric film, conductive film, alloy film, semiconductor film and so on. The instrument is equipped with a magnetron sputtering target with a water-cooled interlayer and a 140mm heatable rotary object stage. The vacuum chamber adopts the top opening method, which makes it easier to change the target, and it is an ideal device for making various metal films. It is an ideal equipment for the preparation of films of various materials in the laboratory.

CYKY-300-1HD single target magnetron sputtering coater specifications:

Product name

Single target magnetron sputtering coater

Product model

CYKY-300-1HD

Installation conditions

This equipment is required to be used at the altitude of 1000m or less, the temperature of 25℃± 15℃, and the humidity of 55% Rh ± 10% Rh.

1. Water: The equipment is equipped with a self-circulating chiller (filling pure water or deionized water)

2. Electricity: AC220V 50Hz, must have a good ground connection.

3. Gas: The equipment chamber needs to be filled with argon gas (purity of 99.99% or more). Self-provided argon gas cylinder (with Ø6mm double   ferrule joint) and pressure reducing valve

4. Workbench: size 650mm × 600mm × 700mm, bearing more than 200kg

5. Ventilation device: need

Main features

1. Configure a single target gun, and a matching DC power supply for sputter   coating of conductive materials.

2. It can prepare a variety of films, and has a wide range of applications.

3. It is small in size and easy to operate.

Technical parameters

1. the power supply voltage: 220V 50Hz

2. rated power: 1200W (excluding vacuum pump)

3. Working vacuum degree: 10-4Pa

4. Working temperature: RT-500, accuracy ± 1×(you can increase the temperature according to   actual needs)

5. the number of target guns: 1

6. target gun cooling method: water cooling

7. Target size: Ø2’’, thickness 0.1-5mm   (different thickness depending on target material)

8. DC sputtering power: 500W (optional)

9. RF sputtering power: 300W / 500W (optional)

10. loading sample table: Ø140mm

11. the sample table speed: adjustable within   1rpm-20rpm

12. Protective gas: inert gases such as Ar and   N2

13. Intake gas path: mass flow meter controls 2   channels of intake air, flow rate is 200SCCM

Product specification

Main unit size: 500mm × 560mm × 660mm, the whole machine size: 1300mm × 660mm × 1200mm; weight: 160kg

Standard accessories

1

DC power control system

1

2

Film thickness monitor system

1

3

Molecular pump

1

4

Chiller

1

5

Cooling water pipe (Ø6mm)

4

Optional accessories

Various targets such as gold, indium, silver, and platinum

After-sales   service

After the goods are delivered, CYKY provides one year of free after-sales service. The service method is limited to remote technical support such as telephone guidance, video guidance, mail guidance, and accessories mailing. If the customer needs to send someone to provide door-to-door service, the customer shall pay the travel expenses and wages of the service personnel during the business trip.

Contact Us
  • E-mail: cysi@cysi.wang
  • Tel: +86 371 5519 9322
  • Fax: +86 371 8603 6875
  • Add: No. 820, 8th Floor, 1st Unit, 9th Block, Cuizhu Street, High-Tech Zone, Zhengzhou, Henan, China
  • Korea Distributor:
    NEO LFN Corp
    Email:info@neolfn.com
    Tel:+82-31-999-4944
    Contact:Haeseop Kim
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