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Dual-target DC magnetron sputtering coater CY-MSP300S-2DCDual-target DC magnetron sputtering coater CY-MSP300S-2DC

Dual-target DC magnetron sputtering coater CY-MSP300S-2DC

    Dual-target DC magnetron sputtering coater is a cost-effective magnetron sputtering coating equipment independently developed by our company. It is standardized, modular and customizable. There are 1-inch or 2-inch magnetron targets for you to choose. Customers can choose the target according to the size of the substrate to be coated.

Dual-target DC magnetron sputtering coater is equipped with two 500W DC power supply. The DC power supply can be used for the preparation of metal film. The two targets can meet the needs of multi-layer or multiple coatings.

The coating machine is equipped with two-channel high-precision mass flowmeter. If you have other requirements, you can customize the gas path of up to four-channel mass flowmeters to meet the complex gas environment construction requirements. The instrument is equipped with advanced turbomolecular pump sets, the ultimate vacuum is up to 1.0E-5Pa, and other types of molecular pumps are available for purchase. Molecular pump gas path is controlled by multiple solenoid valves, you can open the chamber to take out the sample without shutting down the pump, greatly improving your work efficiency. This product can be equipped with an integrated industrial computer to control the system. In the computer program, most functions such as vacuum pump control and sputtering power control can be realized, which can further improve your experimental efficiency.

Dual-target DC magnetron sputtering coater application:

This device can be used for preparing single-layer or multi-layer ferroelectric thin films, conductive films, alloy films, and the like. Compared with similar equipment, the dual-target magnetron sputtering coater is not only widely used, but also has the advantages of small size and easy operation, and is an ideal equipment for preparing material films in a laboratory.

Dual-target DC magnetron sputtering coater technical parameters:

Sample stage

Size

φ185mm

Temperature control accuracy

±1℃

Heating temperature

Max 500℃

Rotate speed

1-20rpm adjustable

Magnetron Sputtering   target head

Quantity

2”×2 (1”,2” optional)

Water chiller

Circulating water chiller   with flow rate of 10L/min

Cooling mode

Water cooling



Vacuum chamber

Chamber size

φ300mm×300mm

Watch window

φ100mm

Chamber material

Stainless steel

Opening mode

Top cover open

Mass flowmeter

2 channels; measuring   range 100SCCM; 100SCCM (can be customized according to customer needs)

Vacuum system

Model

CY-GZK103-A

Pumping interface

KF40

Molecular pump

CY-600

Exhaust interface

KF16

Backing pump

rotary vane pump

Vacuum measurement

Compound vacuum gauge

Ultimate vacuum

1.0E-5Pa

Power supply

AC;220V 50/60Hz

Pumping rate

Molecular pump: 600L/S   rotary vane pump: 1.1L/S  

Comprehensive gas pumping performance: vacuum up to 1.0E-3Pa in 20 minutes

Power configuration

Quantity

DC power supply×2

Max output power

DC 500W

Other parameters

Supply voltage

AC220V,50Hz

Overall size

600mm×650mm×1280mm

Total power

2.5KW

Total Weight

About 300kg

Disclaimer: The product introduction content (including product images, product descriptions, technical parameters, etc.) of this site is for reference only. As the update may not be timely, there will be some differences between the content and the actual situation. Please contact our sales staff to confirm. The information provided on this site does not constitute any offer or promise, and the company will improve and modify any information on the website from time to time without prior notice.

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  • Tel: +86 371 5519 9322
  • Fax: +86 371 8603 6875
  • Add: No. 820, 8th Floor, 1st Unit, 9th Block, Cuizhu Street, High-Tech Zone, Zhengzhou, Henan, China
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    Tel:  +82-31-999-4944
    Contact: Haeseop Kim
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