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Magnetron sputtering/vacuum evaporation composite coating equipment CY-MSE300S-DC

Magnetron sputtering/vacuum evaporation composite coating equipment CY-MSE300S-DC

    The magnetron sputtering/vacuum evaporation composite coating equipment combines magnetron sputtering technology and vacuum evaporation technology in one coating equipment. 

The magnetron sputtering/vacuum evaporation composite coating equipment combines magnetron sputtering technology and vacuum evaporation technology in one coating equipment. In this device, magnetron sputtering cathode glow discharge is used to sputter the target atoms and partially ionize and deposit them on the substrate to form a film, and at the same time, the metal plating material can be melted in a vacuum by resistance heating and vaporized and then deposited on the substrate to form a film. This increases the utility and flexibility of the device. The equipment is used for metallization of plastic surface such as mobile phone case and deposition of non-conductive film and electromagnetic shielding film.

The magnetron sputtering/vacuum evaporation composite coating equipment is equipped with a plasma processing device, a high-efficiency magnetron sputtering cathode and a resistance evaporation device, etc. The deposition rate of this device is fast, the coating adhesion is good, the plating layer is fine and compact, the surface finish is high, the uniformity and consistency is good; the machine realizes full automatic control of coating process, large load, reliable work, high qualification rate, low production cost and green environmental protection. 

Magnetron sputtering/vacuum evaporation composite coating equipment application:

The device is widely used in computer casings, mobile phone cases, household appliances and other industries, and can be coated with metal film, alloy film, composite film layer, transparent (translucent) film, non-conductive film, electromagnetic shielding film and the like.

Magnetron sputtering/vacuum evaporation composite coating equipment specifications:

Product Model

Magnetron sputtering/vacuum evaporation composite coating equipment CY-MSE300S-DC

Sample stage

Size

Φ185mm

Temperature control accuracy

±1

Rotating speed

1-20rpm adjustable

Sputter current

2~20mA

Sputter voltage

1000V

Evaporation source

Tungsten wire basket

Maximum temperature

1700

Precise temperature control

30-segment lifting and lowering temperature program can be set

Vacuum chamber

Chamber size

φ300mm × 300mm

Watch window

φ100mm

Chamber material

Stainless steel

Opening method

Top over open

Film thickness monitor

Monitoring components

Power supply

DC 5V (±10%), maximum current 400mA

Frequency resolution

±0.03Hz

Film thickness resolution

0.0136Å (aluminum)

Film thickness accuracy

±0.5%, depending on process conditions, especially sensor position, material stress,   temperature and density

Measuring speed

100ms-1s/times, settable

Measuring range

500000Å (aluminum)

Standard sensor crystal

6MHz

Computer interface

RS-232/485   serial interface (baud rate 1200, 2400, 4800, 9600, 19200, 38400 can be set,   data bit: 8, stop bit: 1, check: none)

Analog output

8-bit   resolution, PWM pulse width modulated output (open collector or internal 5V output)

Working environment

Temperature 0-50℃, humidity 5%-85% RH, no condensation beads

Displayer

Input power

AC 220V±10%

Output power

DC 5V 3A

Displayer

12×2 digital tube and LED

Communication  port

RS-485   (baud rate 1200, 2400, 4800, 9600, 19200, 38400 can be set, data bit: 8 bits,   stop bit: 1 bit, parity: none)

Probes

Applicable wafer frequency

6MHz

Applicable   wafer size

Φ14mm

Mounting flange

CF35

Cooling water pipe

Φ3mm, length 00mm, 500mm, 1000mm

Cooling water pressure

<0.3MPa

Pneumatic baffle pipe

Φ3mm

Baking temperature

Water supply state <200℃, water-free state flange <100℃

Electrical Interface

BCN socket

Mass flowmeter

2 channels; measuring range 100sccm; 100sccm (can be customized according to customer needs)

Vacuum system

Model

CY-GZK103-A

Pumping interface

KF40

Molecular pump

CY-600

Exhaust interface

KF16

Backing pump

Rotary vane pump

Vacuum measurement

Compound vacuum gauge

Ultimate vacuum

1.0E-5Pa

Power supply

AC;220V   50/60Hz

Pumping rate

Molecular pump: 600L/S rotary vane pump: 1.1L/S Comprehensive pumping performance: The vacuum can reach 1.0E-3Pa in 20 minutes.

Optional accessories

Various targets such as gold, indium, silver, and platinum

Warranty

One year warranty, lifetime technical support.

Disclaimer: The product introduction content (including product images, product descriptions, technical parameters, etc.) of this site is for reference only. As the update may not be timely, there will be some differences between the content and the actual situation. Please contact our sales staff to confirm. The information provided on this site does not constitute any offer or promise, and the company will periodically improve and modify the website information, without prior notice, please understand.

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  • Fax: +86 371 8603 6875
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