Input Power | 220 VAC, 50/60Hz, single phase 800 W (including pump) If the voltage is 110 VAC, a 1000 W transformer is required
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Source Power | One 13.5 MHz, 300 W RF Generator with automatic matching function is built in cabinet and connected to 2" sputtering head |
Magnetron Sputtering Head | One 2" Magnetron Sputtering Heads with water cooling jackets are included and inserted into quartz chamber via quick clamp One shutter is built on the flange (manually operated) One 16 L/min digitally controlled recirculation water chiller is installed on bottom cabinet for cooling magnetron sputtering heads.
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Sputtering Target | Target size requirement: 2" diameter×1/4"thickness Max One SiO2 target is included for demo test. Al2O3 ceramic target Recommend Coating Method
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Vacuum Chamber
| Vacuum Chamber: 160 mm OD×150 mm ID ×250 mm Height. made of high purity quartz Sealing Flange: 165 mm Dia. made of Aluminum with high-temperature silicone O-ring Stainless steel mesh cover is included for 100% shielding RF radiation from chamber Vacuum level: 1.0E-2 Torr with included dual stage mechanical pump and 1.0E-5 Torr with optional turbo pump
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Sample Holder | Sample holder is rotatable and heat-able made of a ceramic heater with stainless steel cover The sample holder size: 50 mm Dia. for 2" wafer max Rotation speed is adjustable: 1-10 rpm for uniform coating The holder temperature is adjustable from RT to 400°C Max with accuracy +/- 1.0 °C via digital temperature controller.
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Vacuum Pump Station
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Overall Dimensions | 650 mm L x 650 mm W x 1630 mm H |
Net Weight | 70 kg |
Warranty & Compliance | One years limited warranty with lifetime support |
