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RF plasma magnetron sputtering coater for non-conductive thin films RF plasma magnetron sputtering coater for non-conductive thin films RF plasma magnetron sputtering coater for non-conductive thin films

RF plasma magnetron sputtering coater for non-conductive thin films

    RF plasma magnetron sputtering coater is a compact 2" single head RF Plasma magnetron sputtering system coating non-metallic, mainly oxide thin film. It integrates all components into one-floor stand cabinet, including RF power source, quartz vacuum chamber, vacuum pump, recirculation water chiller and film thickness monitor etc.

RF plasma magnetron sputtering coater is an excellent and cost effective coater for coating thin film of non-conductive material in RF plasma magnetron sputtering coater is small in size, occupies less laboratory space, simple in operation and widely used. Therefore, it is widely used in the laboratories of major universities and research institutes.

magnetron sputtering coater

RF plasma magnetron sputtering coater specificactions:

Input Power

  • 220 VAC, 50/60Hz, single phase

  • 800 W  (including pump)

  • If the voltage is 110 VAC, a 1000 W transformer is required

Source Power

One 13.5 MHz, 300 W RF Generator with automatic matching function is built in cabinet and connected to 2" sputtering head 

Magnetron   Sputtering Head

  • One 2" Magnetron Sputtering Heads with water cooling jackets are included and inserted into quartz chamber via quick clamp

  • One shutter is built on the flange (manually operated)

  • One 16 L/min digitally controlled recirculation water chiller is installed on bottom cabinet for cooling magnetron sputtering heads.

Sputtering   Target

  • Target size requirement: 2" diameter×1/4"thickness Max

  • One SiO2 target is included for demo test.

  • Al2O3 ceramic target Recommend Coating Method

Vacuum   Chamber
 
 

  • Vacuum Chamber: 160 mm OD×150 mm ID ×250 mm Height. made of high purity quartz

  • Sealing Flange: 165 mm Dia. made of Aluminum with high-temperature silicone O-ring

  • Stainless steel mesh cover is included for 100% shielding RF radiation from chamber

  • Vacuum level: 1.0E-2 Torr with included dual stage mechanical pump and 1.0E-5 Torr with optional turbo        pump

Sample Holder

  • Sample holder is rotatable and heat-able made of a ceramic heater with stainless steel cover

  • The sample holder size: 50 mm Dia. for 2" wafer max

  • Rotation speed is adjustable: 1-10 rpm for uniform coating

  • The holder temperature is adjustable from RT to 400°C Max with accuracy +/- 1.0 °C via digital temperature controller.

Vacuum Pump Station
 
 

  • KF25 Vacuum port is built in for connecting to a vacuum pump.

  • Vacuum level: 1.0E-2 Torr with included dual stage mechanical pump

Overall   Dimensions

650 mm L x 650 mm W x 1630 mm H             

Net   Weight

70 kg

Warranty   & Compliance

One years limited warranty with lifetime support

Contact Us
  • E-mail: cysi@cysi.wang
  • Tel: +86 371 5519 9322
  • Fax: +86 371 8603 6875
  • Add: No. 820, 8th Floor, 1st Unit, 9th Block, Cuizhu Street, High-Tech Zone, Zhengzhou, Henan, China
  • Korea Distributor:
    NEO LFN Corp
    Email:info@neolfn.com
    Tel:+82-31-999-4944
    Contact:Haeseop Kim
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