DC/RF dual-head high vacuum magnetron plasma sputtering coater is a compact magnetron sputtering system with dual 2 target sources, e.g., one DC source for coating metallic film, and the other RF source for coating non-metallic material.
DC/RF dual-head high vacuum magnetron plasma sputtering coater is designed for coating both single or multiple film layers for a wide range of materials, such as alloy, ferroelectric, semiconductor, ceramic, dielectric, optical, PTFE, etc.Compared with similar equipment, it has the advantages of small size and easy operation, and a wide range of materials that can be used. It is an ideal equipment for preparing various types of material films in the laboratory.
Single phase 220 VAC 50 / 60 Hz, 2000 W (including vacuum pump and water chiller)
Magnetron Sputtering Head
Gas Flow Control
Vacuum Pump Station
Lid closed: 48" × 28" × 32"
Lid open: 48" × 28" × 37"
One years limited warranty with lifetime support