This equipment is a dual-target magnetron coater, which can be used for the preparation of metal films. It is used in the fields of electronics, optics, special ceramics, etc. It can also be used for laboratory SEM sample preparation
This equipment is a dual-target magnetron coater, which can be used for the preparation of metal films. It is used in the fields of electronics, optics, special ceramics, etc. It can also be used for laboratory SEM sample preparation. This set of configurations uses a high-vacuum stainless steel chamber, and the chamber is equipped with a quartz observation window with a baffle to facilitate experimental observation and recording; the chamber design has excellent vacuum performance and a compact shape, which is very suitable for laboratory use. At the same time, the equipment is equipped with a rotating heating sample table, which can effectively improve the uniformity of the film and the quality of the film. The whole machine adopts a modular design, with simple operating logic and an intuitive operating interface, which is easy to use.
Application field:
This equipment is a dual-target magnetron coater, which can be used for the preparation of metal films. It is used in the fields of electronics, optics, special ceramics, etc. It can also be used for laboratory SEM sample preparation
Technical parameters:
Product name | Desktop dual-target magnetron sputtering coater machine | |
Product model | CY-MSZ254-II-DC-SS | |
Sample table | Dimensions | φ100mm |
Adjustable speed | ≦20rpm | |
Magnetron target gun | Equipped with two two-inch magnetron targets, target size: diameter 50.8mm, thickness ≦3mm | |
Vacuum chamber | Cavity size | φ254mm X 300mm |
Observation window | Front-mounted | |
Cavity material | 304 stainless steel | |
Opening method | Opening cover and front door | |
Vacuum system
| Pre-stage pump | Bipolar rotary vane pump |
Molecular pump | High pumping speed turbomolecular pump | |
Vacuum measurement | Compound vacuum gauge, range: 10-5~105Pa | |
Exhaust interface | ISO63 | |
Exhaust interface | KF16 | |
System vacuum | 1.0×10-4Pa | |
Power supply | AC 220V 50/60Hz | |
Exhaust rate | Pre-stage pump pumping speed 1.1L/s | |
Output power | DC power supply 500W | |
Other parameters | Power supply voltage | AC220V,50Hz |
Total power | 2kW | |
Total size | 710*480*580 |
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