This type of small plasma sputtering coating machine adopts two-stage sputtering method, which is widely used for SEM sample preparation or metal coating experiment. Using low-temperature plasma sputtering process, there is no high temperature during the coating process, and it is not easy to produce thermal damage. This small plasma sputtering coater uses PLC control system, all touch screen operation, easy to learn and use. This small plasma sputtering instrument uses a PLC control system, all touch screen operation, easy to learn and use. The equipment is small in size and beautiful in appearance, making it the best choice for laboratory coating experiments.
Three target heads small plasma sputtering coater specifications:
Sample stage | Size | 100mm |
Distance from sample stage to target surface | 20~35mm height adjustable |
Plasma sputtering source | Quantity | 2 inchesx3 |
Cooling method | Natural cooling |
Vacuum chamber | Chamber size | φ180mm x 210mm |
Observation window | Omnidirectional visibility |
Chamber material | High purity quartz |
Open method | Top cover removable |
Upper and lower cover material | 304 stainless steel |
Pumping port | KF16 |
Intake port | 1/4 inch ferrule connector |
Power configuration | Quantity | DC power supplyx1 |
Output power | Max. 150W |
Sputtering power | 1200V |
Max. sputtering current | 50mA |
Vacuum system | Vacuum pump type | Dual-stage rotary vane vacuum pump |
Pumping port | KF16 |
Exhaust interface | KF16 |
Pumping rate | 1.1L/s(4m3/h) |
Ultimate vacuum | ≥0.1Pa |
Vacuum measurement | Resistance vacuum gauge |
Others | Power supply | AC 220V 50Hz |
Total power | 1.5kW |
Dimension | 500mm x 320mm x470mm |
Weight | 30kg |
