The plasma sputtering and evaporation two-in-one coating machine is equipped with DC sputtering target and thermal evaporation assembly, which can not only be used for metal film plating by plasma sputtering, but also obtain carbon or other metal elemental films by evaporation.
This vacuum chamber of coating machine is made of 304 stainless steel, and the coating process is completely visible. The instrument is equipped with two stage rotary vane vacuum pump, which can quickly reach the vacuum degree of 1.0E-3pa, Ultimate vacuum 1.0E-5Pa, and can meet the vacuum environment required by most evaporation coating experiments and diode sputtering experiments. This instrument has small size which can save space and can be used on the test bench. One machine has multiple purposes, which is cost-effective and very suitable for major universities and research institutions to choose.
Technical parameters of coating machine:
Model | CY-EVS180S-HV |
Supply voltage | AC220V, 60Hz |
Maximum power | 1200W |
Sample Stage | Diameter φ65mm; Adjustable distance from evaporation source, adjustable range 60mm-100mm |
Vacuum chamber | Material: 304 stainless steel O.Dφ168mm x I.Dφ160mm x 210mm |
Maximum temperature | 1700℃ |
Thermocouple | B type thermocouple |
Vacuum gauge | Electronic vacuum gauge |
Vacuum system | Backing pump: oil-free pump, pumping speed 30L / min Secondary pump: pumping speed 90L / s |
Vacuum interface | KF40 |
Intake port | 1/4 card sleeve connector |
Overall size | 500x350x400mm |
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