The small plasma sputtering and evaporation two-in-one coating machine is equipped with DC sputtering target and thermal evaporation assembly, which can not only be used for metal film plating by plasma sputtering, but also obtain carbon or other metal elemental films by evaporation.
The plasma sputtering and evaporation two-in-one coating machine is equipped with DC sputtering target and thermal evaporation assembly, which can not only be used for metal film plating by plasma sputtering, but also obtain carbon or other metal elemental films by evaporation. The instrument components are highly integrated, which realize two kinds of coating functions in the same chamber. This coating machine adopts high purity quartz chamber as vacuum chamber, and the coating process is completely visible. The instrument is equipped with two stage rotary vane vacuum pump, which can quickly reach the vacuum degree of 1.0E-1pa, and can meet the vacuum environment required by most evaporation coating experiments and diode sputtering experiments. This instrument has small size which can save space and can be used on the test bench. One machine has multiple purposes, which is cost-effective and very suitable for major universities and research institutions to choose.
Scanning electron microscope sample surface gold spraying, gold steaming carbon spraying and other operations, as well as the production of non-conductor material test electrode.
Small two-in-one coating machine
Distance to the evaporation source
DC sputtering head
Tungsten wire basket
S type thermocouple
High purity quartz
Top cover removable
Rotary vane pump
Rotary vane pump：1.1L/S
Sputter Power Configuration
DC power supply x1
Max Power Output
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