Compact plasma cleaner a 3" compact plasma cleaner with digital vacuum sensor and display, and as well as the hinged door. It is designed for cleaning and removing nanoscale organic contamination on wafer up to 2" with various gas easily.
Compact plasma cleaner is an excellent tool to pre-clean single crystal substrate before coating to the achieve a better film quality.The rate of organic removal is about 10 nm/min Maximum at high RF power.
1. Cleaning and removing nanoscale organic contamination on wafer up to 2" with various gas easily.
2. Excellent tool to pre-clean single crystal substrate before coating to the achieve a better film quality
Hinged type door for easy sample loading.
3. 3" Diameter Quartz Chamber excellent for cleaning 2" wafer with option Quartz Boat
4. Removable Quartz tube inside Quartz Chamber easy to clean and replacement.
RF power (High voltage & high frequency current applied on the coil) is adjustable at three levels:
Vacuum Gauge & Display
One double stage Rotary Vane Vacuum Pump is included.
AC 208 - 240V, 50/60Hz, single phase
One-year limited warranty with lifetime support ( no warranty for Pyrex glass chamber )