Desktop UV ozone cleaner

Environment Requirement

• Indoor Use Only; Altitude Use Up To 5,500 Feet;

• Temperature Range 41-104 Degrees Fahrenheit;

• Maximum Relative Humidity 80%, Up To 87 Degrees Fahrenheit Decreasing Linearly to 50% Relative Humidity At 104 Degrees Fahrenheit;

• Main power supply fluctuations not to exceed 10% of the nominal voltage; overvoltage category II;

• Pollution Degree 2; ozone level (ambient) measurement at <45 ppb.

UV   Lamp

• Solid metal double wave mercury lamp 

• Wave Length: 253.7nm and 184.9nm 

• UV lamp service life: 5000 hrs

• UV light area: 200×200 mm 

• Can clean crystal wafer with diameter up to 12“

Chamber & Sample Stage

• Stainless steel case

• Sliding drawer for easy sample loading

• Sample stage area is 310 mm×320 mm (12"×12" )

• Ozone venting device is built in the chamber

• Timer ranges from 0.01 seconds to 99.9 hours.

Heatable Sample Stage

• Sample stage is heatable up to 150℃ with precision temperature controller

• Temperature controller is 20 segments programmable with +/-2℃ accuracy

• Temperature uniformity:<10℃ within 6 inches diameter area; <20℃ within 12 inches diameter

• Heating rate: 15℃ max. 

• The distance between sample stage and lamp is adjustable from 20mm to 40mm.

Vent Port
 

• 3 in. diameter vent port is built in the back of the machine

• One 10 ft. flexible pipe and one vent clamp are included for connecting the cleaner exhaust to a lab venting system.

Dimension

510mm×350mm×400mm (W×H×D)

Net Weight

62 lbs

Warranty

One-year limited warranty with lifetime support. The fragile UV lamp is not included in the warranty.

Application

• Clean silicon wafer, Gallium Arsenide wafer, quartz and ITO glass

• Clean all types of oxide single crystal substrate such sapphire, STO, and LAO.

• Clean gold and Pt surface

• Oxidizing surface of light metallic material

• Activate Polymers and Crosslink Polymers

• UV Strip Photo Resist / Photoresist

• UV Clean Production Line LED displays