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RF Plasma Cleaner / Etcher with Vacuum Pump

    RF plasma cleaner is a plasma cleaner or etching unit with 8.5 "Dia×14"Length quartz chamber and 0 - 80W variable RF power. It is designed to clean and remove nano-scale organic contamination on the substrate or wafer up to 8" using air, oxygen, or argon plasma.The rate of organic removal is about 20 nm/min Maximum at high RF power.

RF plasma cleaner is an excellent tool to pre-clean single crystal substrate before epitaxial film deposition to achieve the better quality.This machine mainly removes the oxide layer and contaminants on the substrate by plasma of air, oxygen or argon gas, and also changes the surface properties of the object (such as hydrophilicity and hydrophobicity),It is an ideal equipment for substrate cleaning and film processing. Pretreatment of single crystal epitaxial films before their growth will have a significant effect on the growth.

RF plasma cleaner specifications:

Input Power

  • AC 220V , 50/60 Hz, 

  • RF Power: 80 W Max. ( standard )   

  • Vacuum Pump: normal 550W, start 750W

  • Total Power: 830W max. 

  • Working current3A

RF Power

  • RF power is adjustable within 0 - 80W

  • RF frequency: 13,56 MH

  • Optional:  300 W RF power supply is  available upon request at extra cost


Plasma Chamber

  • 8.5" O.D×8.2" I.D×14" L  high purity quartz chamber

  • Volume: 12 L

  • Hinged type front flange made of aluminum

  • 2.3" Dia. ( 60mm) quartz window for easy observation

  • Totally RF radiation shield with zero RF leaking

Control Panel

  • 6" color touch screen to control all parameters automatically for plasma cleaning, such as vacuum level, gas flow rate, RF power level, and cleaning time.

  • Built in one channel Mass flow meter ( 0 - 500ml/minute)  to control gas flow within +/- 0.5 ml/m

Vacuum Pump and Valve
 
 

  • 240 L/m Heavy Duty Rotary Vane Vacuum Pump with Exhaust Filter, KF25D Adaptor and Clamp are included for immediate use

  • Ultimate total pressure of 50 mTorr

Inert Gas

  • Many inert gases can be chosen for plasma cleaning such as N2, Ar, Air and mixed gas depended on what kind material will be treated. ( not included in the package)

  • No flammable gas shall be used for the plasma cleaner

Overall Dimensions

  • 620 L×600 W×600 H, mm

  • 24" × 23.5" × 23.5" ( inch )

Warranty

One year limited warranty with lifetime support ( no warranty   for Pyrex glass chamber )

Contact Us
  • E-mail: cysi@cysi.wang
  • Tel: +86 371 5519 9322
  • Fax: +86 371 8603 6875
  • Add: No. 820, 8th Floor, 1st Unit, 9th Block, Cuizhu Street, High-Tech Zone, Zhengzhou, Henan, China




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