The tube size of the RTP rapid annealing furnace is 120mm, which can directly place 4 inches of material. The reaction zone of the sample is in a closed quartz chamber, which greatly reduces the possibility of indirect contamination of the sample while completing the production process. The device is equipped with LCD high-definition touch screen, and the setting data experiment operation is all graphic interface. It is convenient and quick to operate, which can greatly improve your experiment efficiency. The equipment has reserved the quick interface for vacuum and air gases, and our vacuum system can be used together with the gas mixing system.
RTP rapid annealing furnace application range:
Rapid annealing furnace equipment can be used for rapid thermal annealing, rapid thermal oxidation, rapid thermal nitridation, silicidation, diffusion, compound semiconductor annealing, post-ion implantation annealing, electrode alloying, crystallization and densification, alloy melting point analysis, thin film deposition, and the like.
RTP rapid annealing furnace technical parameters:
Model | CY-O1000-120I-T-RTP |
Furnace tube material | High purity quartz |
Furnace tube diameter | 120mm |
Furnace tube length | 500mm |
Furnace chamber length | 440mm |
Heating zone length | 400mm |
Constant temperature zone | 200mm |
Operating temperature | 0～500℃ |
Heating rate | Recommended 80℃/ s, fast heating rate 200℃/s |
Cooling speed | More than 200℃≤25 min |
Temperature control accuracy | ±1℃ |
Temperature control mode | 30 or 50 segment program temperature control |
Display mode | LCD touch screen |
Sealing method | 304 stainless steel vacuum flange |
Flange interface | 1/4" ferrule connector (Ø8 pagoda-shape connector) |
Vacuum | 4.4E-3Pa |
Power supply | AC:220V 50/60Hz |
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