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Laboratory cvd mos2 thin film preparation sliding two zone rtp tube furnace CY-O1200-50IIC-RTP Laboratory cvd mos2 thin film preparation sliding two zone rtp tube furnace CY-O1200-50IIC-RTP Laboratory cvd mos2 thin film preparation sliding two zone rtp tube furnace CY-O1200-50IIC-RTP

Laboratory cvd mos2 thin film preparation sliding two zone rtp tube furnace CY-O1200-50IIC-RTP

    Application

    1.Rapid Thermal Annealing,ion implantation annealing

    2.Graphene CVD preparation, nanotube growthing

    3.Rapid thermal oxidation,Rapid thermal Nitriding

    4.Silicidation,diffusion,contact alloying,crystallization and densification


Model No.

CY-O1200-50IIC-RTP

Display

Two separately LED digital gauge

Limiting temperature

1150℃

Working temperature

≤1100℃

Heating rate

0-20℃/min

Heating Zone length

two heating zone
200+200mm 

constant temperature zone:200mm

Quartz tube diameter

OD50*1200mm

Temperature accuracy

± 1℃

Heating element

Alchrome

Thermal couple

K TYPE

Cooling method

Double layer structure with fan cooling

Temperature control

30 steps programmable PID control

Chamber material

Alumina fiber

Over-temperature alarm

Yes

Over-current alarm

Yes

Sealing flange

S.S vacuum flange

Cooling method

air forced cooling

Gas mixer

One way with Float Flow Controller

Main Power

4.5Kw

Working voltage

AC220V,50Hz

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    Contact:Haeseop Kim
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