This equipment is a wafer level large-size molybdenum disulfide preparation device designed based on CVD principles. It includes a three-zone tube furnace, a specially designed furnace tube and a set of supporting gas paths. The equipment can uniformly release the reaction gas into the furnace tube through a specially designed pipeline to ensure the consistency and uniformity of the product on the back-end wafer. It is the best choice for molybdenum disulfide preparation experiments.
Technical parameters:
Product model | CY-O1200-120III-IC-3Z-MoS2 |
Furnace tube material | High purity quartz |
Furnace tube size | External large quartz tube φ120mm x1000mm Internal small quartz tube φ25mm x820mm x7 |
Temperature zone length | Three heating zone 200mm+200mm+200mm |
Temperature control accuracy | ±1℃ |
Temperature curve | Independent temperature control in three temperature zones, each temperature zone can be set with 30-segment time temperature curve |
Operating temperature | 0~1150℃ |
Heating rate | ≤10℃/min |
Intake system | Three-channel mass flow meter Ar gas 0~500sccm N2 gas 0~200sccm H2 gas 0~200sccm Equipped with seven channels of gas separation, gas mixing gas path. |
Furnace pipe flange | Stainless steel water-cooled flange, equipped with KF16 vacuum interface, mechanical vacuum gauge and stainless steel needle valve |
Power requirements | AC 220V 50Hz 4kW |
Control mode | 7-inch touch screen |
Vacuum pump | Dual stage rotary vane vacuum pump |
Vacuum | Theoretical ultimate vacuum degree 10^-1Pa |
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