Compact CVD system with 1200°C tube furnace 3 gas way float flow controller-CY-O1200-50IC-3F

Compact CVD system with 1200°C tube furnace 3 gas way float flow controller-CY-O1200-50IC-3F

This compact cvd system is composed by a mini tube furnace, a rotary vacuum pump, a 3 gas way float flow controller and a digital vacuum gauge. This compact cvd system is widely used in laboratory thin film preparation, such as MoS2, graphene etc.

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Furnaceparameters	FurnaceConstruction	•Highpurityceramicfiberinsulation(energysaving30%andweight lighterabout30%thanoldfurnace). •Doublelayerssteelcasingwithfancooling,toensurethe surfaceoffurnacebelow50°C. •Perfectsealingstainlesssteelflangewithblock.
	ChamberSize	Φ501000mm,Φ601000mm,Φ801000mm,Φ1001000mm orascustomized
	Power	0.8KW~10KW,baseontheheatingzonelength
	Voltage	AC220V50/60Hz
	Max.Temperature	1200°C(<2hour)
	ContinuousWorkTemp.	1150°C
	Max.HeatingRate	20°C/min
	TemperatureController	•PIDautomaticcontrolandauto-tunefunction. •30programmablesegmentsforprecisecontrol. •Over-heatedandbrokenThermalcouple. •DigitalcontrolpanelLEDbuttonorLCDtouchscreen
	TemperatureAccuracy	+/-1°C
	HeatingElement	Aludirome
	ThermalCouple	Ktype
VacuumPump	·AC220V50Hz1/2HP375W ·2Liter/Sor120liter/m ·Oiltrap(inlet)andexhaustfilter(outlet)areinstalled. ·Max.vacuum:10-2torr
Float Flow Control	3 gas way 16~160,25~250,60~600ml/min as customized
Warranty	Oneyearlimitedwarranty(Consumablepartssuchasthermocouple,doorblockandheatingelements