Home > Products > CVD System
Sliding 1200 degree Tube Furnace with three gas mixer,vacuum pump for CNT Preparation Sliding 1200 degree Tube Furnace with three gas mixer,vacuum pump for CNT Preparation Sliding 1200 degree Tube Furnace with three gas mixer,vacuum pump for CNT Preparation

Sliding 1200 degree Tube Furnace with three gas mixer,vacuum pump for CNT Preparation

    Application

    1.Regional refinding for semiconductor of germanium and silicon

    2.CVD experiment

    3.Preparation of carbon nanotubes

    4.Growth of graphene

    5.Crystalline silicon substrate coating

    6.Diffusion welding for metal materials

    7.Heat treatment under the vacuum of atmosphere surroundings


Features

1.Fast heating and cooling, maximum rate: 0-100°c/min 

2.Multi-function: CVD experiment, growth of graphene, crystalline silicon substrate coating,etc.

3.LED display or LCD touch screen

4.Slide type, can manual sliding or electric sliding

5.Can connect with vacuum pump and atmosphere furnace.



Model

CY-T1200-80IC

Display

LED

Limiting temperature

1200℃

Working temperature

≤1200℃

Heating rate

Suggestion 0~20℃/min

Temperature zone

Single

Temperature accuracy

±1℃

Chamber size

Φ80×1200(mm)

Heated length

440mm

Furnace structure

High purity Al2O3 insulation chamber
guarantees excellent temperature uniformity.

Cooling fans are installed at the
bottom of the furnace to ensure efficient ventilation.

Sliding flange assembly are made of stainless steel.

Heating element

Imported alloy heating wire

Thermal couple

K Type

Rated power

1.5 Kw

Temperature control

PID automatic control via SCR power control

Chamber material

Alumina Fiber

Flange connection

Stainless steel flange

Sliding Rail

800mm long sliding rail is installed with one
end flange to make loading & unload sample easy.

Mass Flow meters

Three precision mass flow meters (0.02% accuracy) with
digital display are installed on
the bottom case to control gas flow rate automatically.

MFC 1: Gas flow range from 0~100 sccm

MFC 2 : Control range from 0~200 sccm

MFC 3 : Control range from 0~200 sccm

Flowing rate accuracy: ±1% FS

Each gas channle has a SS needle valve for easy on/off

The flow rate is adjustable from the MFC panel

Vacuum pump and valve

Pumping rate: 8m3/h 50Hz; 9.6m3/h 60Hz.

Vacuum degree:10Pa

KFD25 adapter and stainless steel pipe are connected
between pump and tube flange with precision ball valve

Working voltage

AC110-480V 50/60 Hz

Contact Us
  • E-mail: cysi@cysi.wang
  • Tel: +86 371 5519 9322
  • Fax: +86 371 8603 6875
  • Add: No. 820, 8th Floor, 1st Unit, 9th Block, Cuizhu Street, High-Tech Zone, Zhengzhou, Henan, China
  • Korea Distributor:
    NEO LFN Corp
    Email:info@neolfn.com
    Tel:+82-31-999-4944
    Contact:Haeseop Kim
Follow Us

Copyright © Zhengzhou CY Scientific Instrument Co., Ltd. All Rights Reserved   

| Sitemap |       Technical Support: