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Laboratory CVD Furnace with water cooling flange and two gas way mixer CY-O1200-50IT-2Z10V Laboratory CVD Furnace with water cooling flange and two gas way mixer CY-O1200-50IT-2Z10V Laboratory CVD Furnace with water cooling flange and two gas way mixer CY-O1200-50IT-2Z10V

Laboratory CVD Furnace with water cooling flange and two gas way mixer CY-O1200-50IT-2Z10V

    CY-O1200-50IT-2Z10V is a laboratory cvd furnace composed by one 1200℃ tube furnace with water cooling system, a two way gas mixer, and rotary vacuum pump. It is designed for laboratory thin film preparation, such as: graphene, MoS2, Nanotube and etc

Model No.

CY-O1200-50IT-2Z10V

Display

LCD Touch Panel

Limiting temperature

1200℃

Working temperature

≤1100℃

Heating rate

0-20℃/min

Heating Zone length

440mm, constant temperature zone:200mm

Quartz tube diameter

OD50*1000mm, 60/80/100/120mm for option

Temperature accuracy

± 1℃

Heating element

Fe-Cr-Al alloy adopt by Mo

Thermal couple

K TYPE

Cooling method

Double layer structure with fan cooling

Temperature control

30 steps programmable PID control

Chamber material

Alumina fiber

Over-temperature alarm

Yes

Over-current alarm

Yes

Sealing flange

Water cooling S.S vacuum flange

Vacuum pump

Mechanical rotary vacuum pump

Cooling method

Air cooling

Connection pipe

stainless steel bellows, manual flap valve

Gas Mixer

2 way gas mixer

Accuracy

±2%F.S.

Repeat accuracy

±0.2% FS

Linear precision

±1%F.S.

Working pressure:

-0.1MPa~0.15MPa

MFC1 Range

0~100SCCM

MFC2 Range

0~200SCCM

Working voltage

AC220V,50Hz

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    Tel:+82-31-999-4944
    Contact:Haeseop Kim
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